DILUTE NITRIDE LONG-WAVELENGTH EMITTER WITH IMPROVED PERFORMANCE OVER TEMPERATURE

    公开(公告)号:US20230261443A1

    公开(公告)日:2023-08-17

    申请号:US17808030

    申请日:2022-06-21

    CPC classification number: H01S5/3409 H01S5/3407

    Abstract: In some implementations, a method may include forming a quantum well (QW) layer using an epitaxial growth process, where the epitaxial growth process is performed according to a first growth mode to form the QW layer. The method may include forming a quantum well barrier (QWB) layer using the epitaxial growth process, where the epitaxial growth process is performed according to a second growth mode to form the QWB layer. In some implementations, a nitrogen flux used in the first growth mode is different from a nitrogen flux used in the second growth mode. In some implementations, a gallium flux used in the first growth mode is different from a gallium flux used in the second growth mode.

    METHODS FOR FORMING A VERTICAL CAVITY SURFACE EMITTING LASER DEVICE

    公开(公告)号:US20220209506A1

    公开(公告)日:2022-06-30

    申请号:US17364287

    申请日:2021-06-30

    Abstract: A method of forming a VCSEL device cavity using a multiphase growth sequence includes forming a first mirror over a substrate, forming a tunnel junction over the first mirror, forming an oxidation aperture (OA) layer over the tunnel junction, forming a p-doped layer over the OA layer, forming an active region over the p-doped layer, forming a second mirror over the active region, and forming a contact layer over the second mirror. The first mirror, the tunnel junction, the OA layer, and the p-doped layer are formed using a metal-organic chemical vapor deposition (MOCVD) process during an MOCVD phase of the multiphase growth sequence. The active region, the second mirror, and the contact layer are formed using a molecular beam epitaxy (MBE) process during an MBE phase of the multiphase growth sequence.

    MANIPULATING BEAM DIVERGENCE OF MULTI-JUNCTION VERTICAL CAVITY SURFACE EMITTING LASER

    公开(公告)号:US20230238775A1

    公开(公告)日:2023-07-27

    申请号:US17654716

    申请日:2022-03-14

    Abstract: A multi junction vertical cavity surface emitting laser (VCSEL) may comprise a substrate, a top contact, and a stack comprising a set of layers formed between the substrate and the top contact. In some implementations, the set of layers formed between the substrate and the top contact may comprise a cavity comprising a first active region, a second active region, and a tunnel junction connecting the first active region and the second active region, a first distributed Bragg reflector (DBR) pair comprising a high-contrast p-type DBR (p-DBR) and a low-contrast p-DBR between the cavity and the top contact, and a second DBR pair comprising a high-contrast n-type DBR (n-DBR) and a low-contrast n-DBR between the cavity and the substrate. The low-contrast p-DBR and the low-contrast n-DBR are located on an inner side of the stack, and the high-contrast p-DBR and the high-contrast n-DBR are located on an outer side of the stack.

    EMITTER WITH VARIABLE LIGHT REFLECTIVITY

    公开(公告)号:US20220385041A1

    公开(公告)日:2022-12-01

    申请号:US17305778

    申请日:2021-07-14

    Abstract: In some implementations, an emitter may include a substrate and a set of layers on the substrate. The set of layers may include a first mirror, a second mirror that includes a partial reflector and an additional layer, and at least one active region between the first mirror and the second mirror. A first reflectivity of the second mirror at a lateral center of the second mirror may be different than a second reflectivity of the second mirror at a lateral edge of the second mirror.

    CONTROLLING BEAM DIVERGENCE IN A VERTICAL-CAVITY SURFACE-EMITTING LASER

    公开(公告)号:US20190067906A1

    公开(公告)日:2019-02-28

    申请号:US15688218

    申请日:2017-08-28

    Abstract: In some implementations, a vertical cavity surface emitting laser (VCSEL) includes a substrate layer and epitaxial layers on the substrate layer. The epitaxial layers may include an active layer, a first mirror, a second mirror, and one or more oxidation layers. The active layer may be between the first mirror and the second mirror, and the one or more oxidation layers may be proximate to the active layer. The one or more oxidation layers may be configured to control beam divergence of a laser beam emitted by the VCSEL based on at least one of: a quantity of the one or more oxidation layers, a shape of the one or more oxidation layers, a thickness of the one or more oxidation layers, or a proximity of the one or more oxidation layers to the active layer.

    MULTIPHASE GROWTH SEQUENCE FOR FORMING A VERTICAL CAVITY SURFACE EMITTING LASER

    公开(公告)号:US20220209501A1

    公开(公告)日:2022-06-30

    申请号:US17364443

    申请日:2021-06-30

    Abstract: A method of forming a vertical cavity surface emitting laser (VCSEL) device using a multiphase growth sequence includes forming a first mirror over a substrate; forming an active region (e.g., a dilute nitride active region) over the first mirror; forming an oxidation aperture (OA) layer over the active region; forming a spacer on a surface of the OA layer; and forming a second mirror over the spacer. The active region is formed using a molecular beam epitaxy (MBE) process during an MBE phase of the multiphase growth sequence and the second mirror is formed using a metal-organic chemical vapor deposition (MOCVD) process during an MOCVD phase of the multiphase growth sequence.

    VERTICAL CAVITY SURFACE EMITTING LASER DEVICE WITH CURRENT-BLOCKING REFLECTOR

    公开(公告)号:US20250125586A1

    公开(公告)日:2025-04-17

    申请号:US18536467

    申请日:2023-12-12

    Abstract: An emitter includes a substrate; a current-blocking distributed Bragg reflector (DBR) arranged on the substrate, wherein the current-blocking DBR includes a plurality of p-n junctions connected vertically in series to form a bidirectional current-blocking structure; a bottom contact layer arranged on the current-blocking DBR; a bottom DBR arranged on the bottom contact layer; a top DBR arranged on the bottom DBR; an active region configured to generate a laser light, wherein the active region is arranged between the bottom DBR and the top DBR; a top contact layer arranged on the top DBR; and an optical output arranged over the top DBR, wherein the emitter is configured to emit the laser light via the optical output.

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