-
公开(公告)号：US20160123894A1
公开(公告)日：2016-05-05
申请号：US14927753
申请日：2015-10-30
Applicant: KLA-Tencor Corporation
Inventor： Jiyou Fu , Noam Sapiens
CPC classification number: G01N21/8851 , G01B11/0616 , G01N21/8806 , G01N21/9501 , G01N2021/8848
Abstract: Methods and systems for simultaneous detection and linked processing of field signals and pupil signals are presented herein. In one aspect, estimates of one or more structural or process parameter values are based on field measurement signals, pupil measurement signals, or both. In addition, the quality of the measurements of the one or more structural or process parameter values is characterized based on the field measurement signals, pupil measurement signals, or both. In some embodiments, field measurement signals are processed to estimate one or more structural or process parameter values, and pupil measurement signals are processed to characterize the field measurement conditions. In some other embodiments, pupil measurement signals are processed to estimate one or more structural or process parameter values, and field measurement signals are processed to characterize the pupil measurement conditions.
Abstract translation: 本文介绍了场信号和瞳孔信号的同时检测和链接处理的方法和系统。 在一个方面，一个或多个结构或过程参数值的估计基于场测量信号，光瞳测量信号或两者。 此外，一个或多个结构或过程参数值的测量的质量基于场测量信号，光瞳测量信号或二者来表征。 在一些实施例中，处理场测量信号以估计一个或多个结构或过程参数值，并且处理瞳孔测量信号以表征场测量条件。 在一些其他实施例中，处理瞳孔测量信号以估计一个或多个结构或过程参数值，并且处理场测量信号以表征瞳孔测量条件。
-
公开(公告)号：US10072921B2
公开(公告)日：2018-09-11
申请号：US14960121
申请日：2015-12-04
Applicant: KLA-Tencor Corporation
Inventor： Jiyou Fu , Noam Sapiens , Kevin A. Peterlinz , Stilian Ivanov Pandev
IPC: G01B11/24 , G01B11/00 , G03F7/00 , G01N21/956 , G01N21/21
CPC classification number: G01B11/002 , G01B11/24 , G01B2210/56 , G01N21/956 , G01N2021/213 , G03F7/00
Abstract: A spectroscopic beam profile metrology system simultaneously detects measurement signals over a large wavelength range and a large range of angles of incidence (AOI). In one aspect, a multiple wavelength illumination beam is reshaped to a narrow line shaped beam of light before projection onto a specimen by a high numerical aperture objective. After interaction with the specimen, the collected light is passes through a wavelength dispersive element that projects the range of AOIs along one direction and wavelength components along another direction of a two-dimensional detector. Thus, the measurement signals detected at each pixel of the detector each represent a scatterometry signal for a particular AOI and a particular wavelength. In another aspect, a hyperspectral detector is employed to simultaneously detect measurement signals over a large wavelength range, range of AOIs, and range of azimuth angles.
-
公开(公告)号：US20160161245A1
公开(公告)日：2016-06-09
申请号：US14960121
申请日：2015-12-04
Applicant: KLA-Tencor Corporation
Inventor： Jiyou Fu , Noam Sapiens , Kevin A. Peterlinz , Stilian Ivanov Pandev
CPC classification number: G01B11/002 , G01B11/24 , G01B2210/56 , G01N21/956 , G01N2021/213 , G03F7/00
Abstract: A spectroscopic beam profile metrology system simultaneously detects measurement signals over a large wavelength range and a large range of angles of incidence (AOI). In one aspect, a multiple wavelength illumination beam is reshaped to a narrow line shaped beam of light before projection onto a specimen by a high numerical aperture objective. After interaction with the specimen, the collected light is passes through a wavelength dispersive element that projects the range of AOIs along one direction and wavelength components along another direction of a two-dimensional detector. Thus, the measurement signals detected at each pixel of the detector each represent a scatterometry signal for a particular AOI and a particular wavelength. In another aspect, a hyperspectral detector is employed to simultaneously detect measurement signals over a large wavelength range, range of AOIs, and range of azimuth angles.
Abstract translation: 分光光束分布测量系统同时检测大波长范围和大范围入射角（AOI）的测量信号。 在一个方面，多波长照明光束在通过高数值孔径物镜投影到样本上之前重新成形为窄线形的光束。 在与样品相互作用后，所收集的光通过沿着一个方向投影AOI范围的波长色散元件，并沿着二维检测器的另一方向波长成分。 因此，在检测器的每个像素处检测的测量信号各自表示用于特定AOI和特定波长的散射测量信号。 另一方面，采用高光谱检测器来同时检测大波长范围，AOI范围和方位角范围内的测量信号。
-
Patent Agency Ranking
公开(公告)号：US10234271B2
公开(公告)日：2019-03-19
申请号：US16100843
申请日：2018-08-10
Applicant: KLA-Tencor Corporation
Inventor： Jiyou Fu , Noam Sapiens , Kevin A. Peterlinz , Stilian Ivanov Pandev
IPC: G01B11/00 , G01B11/24 , G03F7/00 , G01N21/21 , G01N21/956
Abstract: A spectroscopic beam profile metrology system simultaneously detects measurement signals over a large wavelength range and a large range of angles of incidence (AOI). In one aspect, a multiple wavelength illumination beam is reshaped to a narrow line shaped beam of light before projection onto a specimen by a high numerical aperture objective. After interaction with the specimen, the collected light is passes through a wavelength dispersive element that projects the range of AOIs along one direction and wavelength components along another direction of a two-dimensional detector. Thus, the measurement signals detected at each pixel of the detector each represent a scatterometry signal for a particular AOI and a particular wavelength. In another aspect, a hyperspectral detector is employed to simultaneously detect measurement signals over a large wavelength range, range of AOIs, and range of azimuth angles.
-
公开(公告)号：US09739719B2
公开(公告)日：2017-08-22
申请号：US14927753
申请日：2015-10-30
Applicant: KLA-Tencor Corporation
Inventor： Jiyou Fu , Noam Sapiens
CPC classification number: G01N21/8851 , G01B11/0616 , G01N21/8806 , G01N21/9501 , G01N2021/8848
Abstract: Methods and systems for simultaneous detection and linked processing of field signals and pupil signals are presented herein. In one aspect, estimates of one or more structural or process parameter values are based on field measurement signals, pupil measurement signals, or both. In addition, the quality of the measurements of the one or more structural or process parameter values is characterized based on the field measurement signals, pupil measurement signals, or both. In some embodiments, field measurement signals are processed to estimate one or more structural or process parameter values, and pupil measurement signals are processed to characterize the field measurement conditions. In some other embodiments, pupil measurement signals are processed to estimate one or more structural or process parameter values, and field measurement signals are processed to characterize the pupil measurement conditions.
-
公开(公告)号：US20180347961A1
公开(公告)日：2018-12-06
申请号：US16100843
申请日：2018-08-10
Applicant: KLA-Tencor Corporation
Inventor： Jiyou Fu , Noam Sapiens , Kevin A. Peterlinz , Stilian Ivanov Pandev
IPC: G01B11/00 , G03F7/00 , G01B11/24 , G01N21/21 , G01N21/956
CPC classification number: G01B11/002 , G01B11/24 , G01B2210/56 , G01N21/956 , G01N2021/213 , G03F7/00
Abstract: A spectroscopic beam profile metrology system simultaneously detects measurement signals over a large wavelength range and a large range of angles of incidence (AOI). In one aspect, a multiple wavelength illumination beam is reshaped to a narrow line shaped beam of light before projection onto a specimen by a high numerical aperture objective. After interaction with the specimen, the collected light is passes through a wavelength dispersive element that projects the range of AOIs along one direction and wavelength components along another direction of a two-dimensional detector. Thus, the measurement signals detected at each pixel of the detector each represent a scatterometry signal for a particular AOI and a particular wavelength. In another aspect, a hyperspectral detector is employed to simultaneously detect measurement signals over a large wavelength range, range of AOIs, and range of azimuth angles.
-
公开(公告)号：US10101676B2
公开(公告)日：2018-10-16
申请号：US15271179
申请日：2016-09-20
Applicant: KLA-Tencor Corporation
Inventor： Jiyou Fu , Noam Sapiens , Kevin A. Peterlinz , Stilian Ivanov Pandev
Abstract: A spectroscopic beam profile metrology system simultaneously detects measurement signals over a large wavelength range and a large range of angles of incidence (AOI). In one aspect, a multiple wavelength illumination beam is reshaped to a narrow line shaped beam of light that is projected onto an overlay metrology target such that the direction of the line shaped beam is aligned with the direction of extent of a grating structure of the overlay metrology target. Collected light is dispersed across a detector according to AOI in one direction and according to wavelength in another direction. The measured signal at each detector pixel is associated with a particular AOI and wavelength. The collected light includes first order diffracted light, zero order diffracted light, or a combination thereof. In some embodiments, first order diffracted light and zero order diffracted light are detected over separate areas of the detector.
-
公开(公告)号：US20170082932A1
公开(公告)日：2017-03-23
申请号：US15271179
申请日：2016-09-20
Applicant: KLA-Tencor Corporation
Inventor： Jiyou Fu , Noam Sapiens , Kevin A. Peterlinz , Stilian Ivanov Pandev
IPC: G03F9/00
CPC classification number: G03F9/7065 , G03F7/70633 , G03F9/7046
Abstract: A spectroscopic beam profile metrology system simultaneously detects measurement signals over a large wavelength range and a large range of angles of incidence (AOI). In one aspect, a multiple wavelength illumination beam is reshaped to a narrow line shaped beam of light that is projected onto an overlay metrology target such that the direction of the line shaped beam is aligned with the direction of extent of a grating structure of the overlay metrology target. Collected light is dispersed across a detector according to AOI in one direction and according to wavelength in another direction. The measured signal at each detector pixel is associated with a particular AOI and wavelength. The collected light includes first order diffracted light, zero order diffracted light, or a combination thereof. In some embodiments, first order diffracted light and zero order diffracted light are detected over separate areas of the detector.
-
-
-
-
-
-
-
Search Results
8
records
(took 0.02 seconds)
