公开(公告)号：US07166827B2

公开(公告)日：2007-01-23

申请号：US10771541

申请日：2004-02-05

申请人： Hirohisa Sugihara ,  Takafumi Endo

发明人： Hirohisa Sugihara ,  Takafumi Endo

IPC分类号： H01L27/00 ,  H04N1/04 ,  H04N1/00

CPC分类号： H01L27/14678 ,  H01L27/14625

摘要： In color reading including an infrared light source, light reflected by a document focuses on a light-receiving part of a sensor IC with different conjugate lengths, due to color aberration of the rod-lens. Since the wavelength of the infrared light is relatively long, the deterioration of the reading resolution appears to be extensive. Here, when reading a document such as a valuable security or a paper bill, a defocusing phenomenon has been prevented, and when reading by infrared light, a high accurate reading characteristic has been realized. As a solution, light is irradiated from a light output window (101a) of a light source (101) and reflected by a document (8), and an infrared light shielding area is provided on a bottom face of a glass (51) placed in an optical path of the light reflected by the document (8), between the document (8) and a sensor IC (3).

摘要翻译： 在包括红外光源的彩色读取中，由于棒状透镜的色差，由文档反射的光聚焦于具有不同共轭长度的传感器IC的光接收部分。 由于红外光的波长相对较长，所以读取分辨率的劣化似乎是广泛的。 这里，当读取有价值的安全性或纸币的文件时，防止了散焦现象，并且当通过红外光读取时，已经实现了高精度的读取特性。 作为解决方案，从光源（101）的光输出窗（101a）照射光并被文件（8）反射，并且在玻璃（51）的底面上设置红外遮光区域， 放置在由文件（8）反射的光的光路中，在文件（8）和传感器IC（3）之间。

公开(公告)号：US20050006562A1

公开(公告)日：2005-01-13

申请号：US10771541

申请日：2004-02-05

申请人： Hirohisa Sugihara ,  Takafumi Endo

发明人： Hirohisa Sugihara ,  Takafumi Endo

IPC分类号： H01L27/14 ,  H01L27/00 ,  H01L27/146 ,  H04N1/028 ,  H04N1/04 ,  H04N1/19 ,  H04N1/40

CPC分类号： H01L27/14678 ,  H01L27/14625

摘要： In color reading including an infrared light source, light reflected by a document focuses on a light-receiving part of a sensor IC with different conjugate lengths, due to color aberration of the rod-lens. Since the wavelength of the infrared light is relatively long, the deterioration of the reading resolution appears to be extensive. Here, when reading a document such as a valuable security or a paper bill, a defocusing phenomenon has been prevented, and when reading by infrared light, a high accurate reading characteristic has been realized. As a solution, light is irradiated from a light output window (101a) of a light source (101) and reflected by a document (8), and an infrared light shielding area is provided on a bottom face of a glass (51) placed in an optical path of the light reflected by the document (8), between the document (8) and a sensor IC (3).

摘要翻译： 在包括红外光源的彩色读取中，由于棒状透镜的色差，由文档反射的光聚焦于具有不同共轭长度的传感器IC的光接收部分。 由于红外光的波长相对较长，所以读取分辨率的劣化似乎是广泛的。 这里，当读取有价值的安全性或纸币的文件时，防止了散焦现象，并且当通过红外光读取时，已经实现了高精度的读取特性。 作为解决方案，从光源（101）的光输出窗（101a）照射光并被文件（8）反射，并且在放置的玻璃（51）的底面上设置红外光屏蔽区域 在由文件（8）反射的光的光路中，在原稿（8）和传感器IC（3）之间。

公开(公告)号：US08962234B2

公开(公告)日：2015-02-24

申请号：US14003480

申请日：2012-03-08

申请人： Ryuji Ohnishi ,  Takafumi Endo ,  Rikimaru Sakamoto

发明人： Ryuji Ohnishi ,  Takafumi Endo ,  Rikimaru Sakamoto

IPC分类号： G03F7/004 ,  G03F7/11 ,  C08G63/60

CPC分类号： G03F7/09 ,  C08G59/1455 ,  C08G59/4223 ,  G03F7/11 ,  G03F7/38

摘要： A resist underlayer film forming composition for lithography, includes: a polymer including a structure of formula (1) below at a terminal of a polymer chain; a cross-linking agent; a compound that promotes a cross-linking reaction; and an organic solvent: (where R1, R2, and R3 are each independently a hydrogen atom, a linear or branched hydrocarbon group having a carbon atom number of 1 to 13, or a hydroxy group; at least one of R1, R2, and R3 is the hydrocarbon group; m and n are each independently 0 or 1; and a main chain of the polymer is bonded to a methylene group when n is 1 and bonded to a group represented by —O— when n is 0).

摘要翻译： 用于光刻的抗蚀剂下层膜形成组合物包括：在聚合物链的末端包含下式（1）结构的聚合物; 交联剂; 促进交联反应的化合物; 和有机溶剂：（其中，R 1，R 2和R 3各自独立地为氢原子，碳原子数为1〜13的直链或支链烃基或羟基; R1，R2和 R3是烃基; m和n各自独立地为0或1;当n为1时，聚合物的主链与亚甲基结合，当n为0时，与-O - 表示的基团键合。

公开(公告)号：US08435721B2

公开(公告)日：2013-05-07

申请号：US12866831

申请日：2009-02-19

申请人： Rikimaru Sakamoto ,  Takafumi Endo

发明人： Rikimaru Sakamoto ,  Takafumi Endo

IPC分类号： G03F7/11 ,  C08G59/42 ,  H01L21/027

CPC分类号： G03F7/091 ,  C08G59/1455 ,  C08G63/20 ,  C08G63/42 ,  C08G63/668 ,  C08G63/6854

摘要： It is an object to provide a resist underlayer film forming composition having a large selection ratio of a dry etching rate, and having a k value and an n value at a short wavelength such as an ArF excimer laser, both of which exhibit desired values. There is provided a resist underlayer film forming composition containing a polymer obtained by reacting at least a tetracarboxylic dianhydride having an alicyclic structure or an aliphatic structure and a diepoxy compound having two epoxy groups with an organic solvent containing an alcohol-based compound having an OH group, and a solvent.

摘要翻译： 本发明的目的是提供一种抗蚀剂下层膜形成组合物，其具有大的干蚀刻速率选择比，并且在诸如ArF准分子激光器的短波长处具有k值和n值，这两者都表现出期望的值。 提供一种抗蚀剂下层膜形成组合物，其含有通过使至少具有脂环结构或脂肪族结构的四羧酸二酐和具有两个环氧基的二环氧化合物与含有具有OH基的醇系化合物的有机溶剂反应而获得的聚合物 ，和溶剂。

公开(公告)号：US08383320B2

公开(公告)日：2013-02-26

申请号：US12682819

申请日：2008-10-16

申请人： Rikimaru Sakamoto ,  Yoshiomi Hiroi ,  Tomohisa Ishida ,  Takafumi Endo

发明人： Rikimaru Sakamoto ,  Yoshiomi Hiroi ,  Tomohisa Ishida ,  Takafumi Endo

IPC分类号： G03F7/11 ,  G03F7/20 ,  C08G59/14 ,  H01L21/027

CPC分类号： C08G63/664 ,  C08G59/1438 ,  C08L63/00 ,  G03F7/091

摘要： There is provided a composition for forming a resist underlayer film not only having a large selection ratio of a dry etching rate but also exhibiting desired values of the k value and of the refractive index n at a short wavelength such as a wavelength of an ArF excimer laser. A resist underlayer film forming composition for lithography comprising: a linear polymer; and a solvent, wherein a backbone of the linear polymer has a unit structure in which 2,4-dihydroxy benzoic acid is introduced through an ester bond and an ether bond.

摘要翻译： 提供了一种用于形成抗蚀剂下层膜的组合物，其不仅具有大的干蚀刻速率选择比，而且在短波长（如ArF准分子的波长）下表现出k值和折射率n的期望值 激光。 一种用于光刻的抗蚀剂下层膜形成组合物，包括：线性聚合物; 和溶剂，其中线性聚合物的主链具有通过酯键和醚键引入2,4-二羟基苯甲酸的单元结构。

公开(公告)号：US08059315B2

公开(公告)日：2011-11-15

申请号：US12466808

申请日：2009-05-15

申请人： Takafumi Endo ,  Yohei Nokami

发明人： Takafumi Endo ,  Yohei Nokami

IPC分类号： H04N1/04 ,  G06K7/10

CPC分类号： H04N1/02815 ,  G07D7/121 ,  H04N1/02855 ,  H04N1/02865 ,  H04N2201/0418

摘要： An image reading device having a compact plane-shaped illumination portion is provided, by which a portion of a target to be light-irradiated can be irradiated with light whose oblique angles are different from each other, and a transmission part of the target can be read. The image reading device includes a conveying means for conveying in a conveying direction a target to be light-irradiated including a transparent portion, a lens assembly, arranged on one side of the target, for focusing transmission light having passed through the transparent portion of the target, a sensor for receiving the transmission light focused by the lens assembly, a light source, positioned on the other side of the target, arranged in a main-scanning direction, and a light guide for guiding light from the light source in a sub-scanning direction, and the light guide having a reflective portion for reflecting the guided light and then irradiating a portion to be irradiated with the reflected light.

摘要翻译： 提供一种具有紧凑的平面状照明部的图像读取装置，通过该图像，能够使倾斜角度彼此不同的光照射被照射的被照射部的一部分，并且目标的透射部可以 读。 图像读取装置包括：传送装置，用于在传送方向上传送包括透明部分的光照射对象物，透镜组件，布置在目标物体的一侧，用于聚焦穿过透明部分的透射光 目标，用于接收由透镜组件聚焦的透射光的传感器，位于靶的另一侧的光源，沿主扫描方向布置;以及光导，用于将来自光源的光引导到子扫描 并且所述光导具有反射部分，用于反射所述被引导的光，然后照射被照射的反射光的部分。

公开(公告)号：US20100221657A1

公开(公告)日：2010-09-02

申请号：US12682819

申请日：2008-10-16

申请人： Rikimaru Sakamoto ,  Yoshiomi Hiroi ,  Tomohisa Ishida ,  Takafumi Endo

发明人： Rikimaru Sakamoto ,  Yoshiomi Hiroi ,  Tomohisa Ishida ,  Takafumi Endo

IPC分类号： G03F7/20 ,  G03F7/004

CPC分类号： C08G63/664 ,  C08G59/1438 ,  C08L63/00 ,  G03F7/091

摘要： There is provided a composition for forming a resist underlayer film not only having a large selection ratio of a dry etching rate but also exhibiting desired values of the k value and of the refractive index n at a short wavelength such as a wavelength of an ArF excimer laser. A resist underlayer film forming composition for lithography comprising: a linear polymer; and a solvent, wherein a backbone of the linear polymer has a unit structure in which 2,4-dihydroxy benzoic acid is introduced through an ester bond and an ether bond.

摘要翻译： 提供了一种用于形成抗蚀剂下层膜的组合物，其不仅具有大的干蚀刻速率选择比，而且在短波长（如ArF准分子的波长）下表现出k值和折射率n的期望值 激光。 一种用于光刻的抗蚀剂下层膜形成组合物，包括：线性聚合物; 和溶剂，其中线性聚合物的主链具有通过酯键和醚键引入2,4-二羟基苯甲酸的单元结构。

公开(公告)号：US20070133858A1

公开(公告)日：2007-06-14

申请号：US11400201

申请日：2006-04-10

申请人： Takafumi Endo ,  Shigeru Toyota

发明人： Takafumi Endo ,  Shigeru Toyota

IPC分类号： G06K9/00

CPC分类号： G07D7/121 ,  G06Q20/042

摘要： An image reading apparatus includes a carrying unit that carries an irradiated object having a reflecting portion and a transmitting portion in a carrying direction, a first light source arranged on one face side of the irradiated object that irradiates light to an irradiated portion in a path of carrying the irradiated object, a second light source arranged on other face side that irradiates light to the irradiated portion, a detecting unit arranged to be spaced apart from the irradiated portion by a predetermined distance that detects the transmitting portion, a lighting control unit that controls to put on the second light source during a time period of passing the transmitting portion through the irradiated portion, a lens array arranged on one face side of the irradiated object that converges reflecting light reflected by the reflecting portion and transmitting light, and a sensor that receives converged light.

摘要翻译： 图像读取装置包括承载单元，其承载具有反射部分和传送部分在运送方向上的被照射物体，第一光源布置在照射物体的一个正面上，该照射物体照射到照射部分的照射部分， 携带被照射物体的第二光源，布置在照射部分上的光的另一面侧的第二光源;检测单元，被布置成与所述照射部分隔开预定距离，所述检测单元检测所述发射部分;控制单元， 在使发送部通过照射部的时间期间放置在第二光源上;透镜阵列，其布置在被照射物体的一个正面侧，会聚反射部反射的反射光并透射光;传感器， 接收会聚光。

公开(公告)号：US09240327B2

公开(公告)日：2016-01-19

申请号：US14236719

申请日：2012-07-31

申请人： Rikimaru Sakamoto ,  Noriaki Fujitani ,  Takafumi Endo ,  Ryuji Ohnishi ,  Bangching Ho

发明人： Rikimaru Sakamoto ,  Noriaki Fujitani ,  Takafumi Endo ,  Ryuji Ohnishi ,  Bangching Ho

IPC分类号： G03F7/11 ,  H01L21/308 ,  H01L21/027 ,  C08G73/06 ,  G03F7/09

CPC分类号： H01L21/3081 ,  C08G73/06 ,  G03F7/091 ,  G03F7/094 ,  G03F7/11 ,  H01L21/0274 ,  H01L21/3086

摘要： There is provided a resist underlayer film composition for EUV lithography that is used in a device production process using EUV lithography, reduces adverse effects of EUV, and is effective for obtaining a good resist pattern, and to a method for forming a resist pattern that uses the resist underlayer film composition for EUV lithography. A resist underlayer film-forming composition for EUV lithography, including: a polymer having a repeating unit structure of formula (1): [where each of A1, A2, A3, A4, A5, and A6 is a hydrogen atom, a methyl group, or an ethyl group; X1 is formula (2), formula (3), formula (4), or formula (0): Q is formula (5) or formula (6): and a solvent. A resist underlayer film-forming composition for EUV lithography, comprising: the polymer having the repeating unit structure of formula (1); a crosslinkable compound; and a solvent.

摘要翻译： 提供了用于EUV光刻的抗蚀剂下层膜组合物，其用于使用EUV光刻的器件制造工艺，减少EUV的不利影响，并且对获得良好的抗蚀剂图案是有效的，以及形成使用的抗蚀剂图案的方法 用于EUV光刻的抗蚀剂下层膜组合物。 一种用于EUV光刻的抗蚀剂下层膜形成组合物，包括：具有式（1）的重复单元结构的聚合物：[其中A1，A2，A3，A4，A5和A6各自为氢原子，甲基 ，或乙基; X1是式（2），式（3），式（4）或式（0）：Q是式（5）或式（6）：和溶剂。 一种用于EUV光刻的抗蚀剂下层膜形成组合物，包括：具有式（1）的重复单元结构的聚合物; 可交联化合物; 和溶剂。

公开(公告)号：US20130209940A1

公开(公告)日：2013-08-15

申请号：US13880470

申请日：2011-09-15

申请人： Rikimaru Sakamoto ,  Bangching Ho ,  Takafumi Endo

发明人： Rikimaru Sakamoto ,  Bangching Ho ,  Takafumi Endo

IPC分类号： C09D5/00

CPC分类号： C09D5/00 ,  C08F12/24 ,  C08G8/08 ,  C08G8/24 ,  C08L61/06 ,  C09D161/06 ,  G03F7/091 ,  G03F7/11 ,  C08F212/32 ,  C08F212/14 ,  C08F220/06

摘要： There is provided a composition for forming an EUV resist overlayer film that is used in an EUV lithography process, that does not intermix with the EUV resist, that blocks unfavorable exposure light for EUV exposure, for example, UV light and DUV light and selectively transmits EUV light alone, and that can be developed with a developer after exposure. A composition for forming an EUV resist overlayer film used in an EUV lithography process including a resin containing a naphthalene ring in a main chain or in a side chain and a solvent, in which the resin may include a hydroxy group, a carboxy group, a sulfo group, or a monovalent organic group having at least one of these groups as a hydrophilic group.

摘要翻译： 提供了用于形成EUV抗蚀剂覆盖膜的组合物，其用于EUV光刻工艺中，其不与EUV抗蚀剂混合，其阻挡用于EUV曝光的不利曝光光，例如UV光和DUV光，并选择性透射 EUV灯单独使用，并且可以在曝光后用显影剂开发。 用于形成EUV抗蚀剂覆盖膜的组合物，其用于EUV光刻工艺，其包括在主链或侧链中含有萘环的树脂和溶剂，其中所述树脂可以包括羟基，羧基， 或这些基团中的至少一个作为亲水基团的一价有机基团。