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公开(公告)号：US11320740B2
公开(公告)日：2022-05-03
申请号：US17228000
申请日：2021-04-12
申请人： Gigaphoton Inc.
IPC分类号： G03F7/20 , H05G2/00 , H01L21/027
摘要： A target supply device may include a first container configured to contain a target substance, a second container configured to contain the target substance supplied from the first container, a first valve disposed between the first container and the second container, a first pipe connected to the second container and configured to supply pressurized gas to the second container, a third container configured to contain the target substance supplied from the second container, a second valve disposed between the second container and the third container, a second pipe connected to the third container and configured to supply pressurized gas to the third container, and a nozzle configured to output the target substance supplied from the third container.
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公开(公告)号：US10674590B2
公开(公告)日：2020-06-02
申请号：US16126829
申请日：2018-09-10
申请人： Gigaphoton Inc.
摘要： A tank may include: a tank main body having a space and an opening; a lid body covering the opening and a peripheral portion of the opening; a bolt for fixing the tank main body and the lid body in the peripheral portion; a first support portion arranged to surround the opening in a region on a side of the opening with respect to the bolt to support the lid body; a second support portion arranged to surround the opening in a region on the opening side with respect to the first support portion and having a height lower than a height of the first support portion; and a sealing member arranged to surround the opening in the region on the opening side with respect to the first support portion.
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公开(公告)号：US08779402B2
公开(公告)日：2014-07-15
申请号：US13675790
申请日：2012-11-13
申请人： Gigaphoton Inc.
IPC分类号： G21K5/00
CPC分类号： B05B17/0607 , B05B12/082
摘要： A target supply device includes a target supply device body including a nozzle having a through-hole through which a target material is discharged, a piezoelectric member having first and second surfaces and connected to the target supply device body at the first surface, the piezoelectric member being configured such that a distance between the first and second surfaces changes in according with an externally supplied electric signal, an elastic member having first and second ends and connected to the second surface of the piezoelectric member at the first end, the elastic member being configured such that a distance between the first and second ends extends or contract in accordance with an externally applied force, and a regulating member configured to regulate a distance between the second end of the elastic member and the target supply device body.
摘要翻译： 目标供给装置包括目标供给装置主体，具有喷嘴，喷嘴具有目标材料排出的通孔，具有第一表面和第二表面并在第一表面连接到目标供给装置主体的压电部件，压电部件 被构造为使得第一和第二表面之间的距离根据外部供应的电信号而变化，弹性构件具有第一端和第二端并且在第一端处连接到压电构件的第二表面，弹性构件被构造成 使得第一和第二端之间的距离根据外部施加的力而延伸或收缩;以及调节构件，其构造成调节弹性构件的第二端和目标供给装置主体之间的距离。
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公开(公告)号：US10136510B2
公开(公告)日：2018-11-20
申请号：US15583001
申请日：2017-05-01
申请人： Gigaphoton Inc.
摘要： An extreme ultraviolet light generation device may include a chamber in which extreme ultraviolet light is generated from plasma, the plasma generated by irradiation of a target supplied in a plasma generation region inside of the chamber with laser light; a condenser mirror collecting the extreme ultraviolet light and guiding it to outside of the chamber; a first etching gas supply unit blowing an etching gas to a reflective surface of the condenser mirror and the plasma generation region; a magnet forming a magnetic field in the chamber; a port that intersects a central axis of the magnetic field and that takes in suspended substances generated in the chamber; and an ejection path that is in communication with the port and that ejects the suspended substances taken from the port to the outside of the chamber.
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公开(公告)号：US09332625B2
公开(公告)日：2016-05-03
申请号：US14707990
申请日：2015-05-08
申请人： GIGAPHOTON INC.
CPC分类号： G03F7/70033 , G03F7/70975 , H05G2/00 , H05G2/003 , H05G2/008
摘要： An EUV light source apparatus by which detachment of a chamber or a part of the chamber, movement to a maintenance area, and highly accurate placement relative to projection optics can be performed easily for maintenance of the EUV light source apparatus. The EUV light source apparatus is an apparatus for generating plasma by applying a laser beam to a target material within a chamber and entering EUV light radiated from the plasma into projection optics of exposure equipment, and includes a positioning mechanism for positioning the chamber or a maintenance unit of the chamber in a predetermined location where an optical axis of the collected extreme ultraviolet light and an optical axis of the projection optics of the exposure equipment are aligned, and a movement mechanism for moving the chamber or the maintenance unit of the chamber between the predetermined location and a maintenance area.
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公开(公告)号：US11363706B2
公开(公告)日：2022-06-14
申请号：US17333538
申请日：2021-05-28
申请人： Gigaphoton Inc.
摘要： A target supply device may include a first containing member configured to contain a target substance; a second containing member configured to contain the target substance flowing from the first containing member; a ring-shaped sealing portion which is formed integrally with one of the first containing member and the second containing member, and is brought into close contact with the other containing member; and a fastening member which fastens the first containing member and the second containing member to each other so that the first containing member communicates with the second containing member through the communication portion, and presses the sealing portion against the other containing member. Here, the sealing portion being plastically deformed by being pressed against the other containing member by the fastening member to seal a gap between the first containing member and the second containing member around the communication portion due to the plastic deformation.
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7.发明授权Target supply apparatus, chamber, and extreme ultraviolet light generation apparatus 有权目标供应装置，室和极紫外光发生装置公开(公告)号：US08785895B2
公开(公告)日：2014-07-22
申请号：US13929668
申请日：2013-06-27
申请人： Gigaphoton Inc.
CPC分类号： H05G2/008 , G03F7/20 , G03F7/70033 , H05G2/001 , H05G2/006
摘要： A target supply apparatus mounted in a chamber in which extreme ultraviolet light is generated by introducing a target material and a laser beam into the chamber may include a target generator having a nozzle, a first pipe configured to cover the nozzle, a cover opening provided in the first pipe to allow the target material to pass through the first pipe, and a first valve configured to open and close the cover opening.
摘要翻译： 安装在通过将目标材料和激光束引入室中而产生极紫外光的室中的目标供给装置可以包括具有喷嘴的目标发生器，被配置为覆盖喷嘴的第一管， 允许目标材料通过第一管的第一管和构造成打开和关闭盖开口的第一阀。
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公开(公告)号：US20130240645A1
公开(公告)日：2013-09-19
申请号：US13715897
申请日：2012-12-14
申请人： GIGAPHOTON INC
IPC分类号： B05B1/14
摘要： A target supply device may include a tank formed cylindrically with a first material, a cylindrical portion for covering the tank, the cylindrical portion being formed of a second material having higher tensile strength than the first material, a first lid formed of the second material and having a through-hole, the first lid being provided at one end in an axial direction of the cylindrical portion, a second lid formed of the second material and provided at another end opposite the one end in the axial direction of the cylindrical portion, and a nozzle provided to be in fluid communication with the interior of the tank and to pass through the through-hole, the nozzle being formed of the first material.
摘要翻译： 目标供给装置可以包括：具有第一材料的圆柱形的罐，用于覆盖罐的圆柱形部分，圆柱形部分由具有比第一材料更高的拉伸强度的第二材料形成，第一盖由第二材料形成， 具有通孔，所述第一盖设置在所述圆筒部的轴向的一端，所述第二盖由所述第二材料形成，并且设置在所述圆筒部的轴向的一端的相反侧的另一端，以及 喷嘴，其设置成与所述罐的内部流体连通并且穿过所述通孔，所述喷嘴由所述第一材料形成。
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公开(公告)号：US10698316B2
公开(公告)日：2020-06-30
申请号：US16379363
申请日：2019-04-09
申请人： Gigaphoton Inc.
发明人： Toshihiro Nishisaka
摘要： A target generation device replacement trolley includes: A. a linear movement mechanism configured to hold a target generation device configured to output a target material and linearly move the target generation device in a direction in which the target material is output; and B. a positioning portion configured to position the linear movement mechanism relative to a mounting part of a chamber on which the target generation device is mounted. The target generation device replacement trolley further includes C. a drive unit configured to drive the linear movement mechanism. The target generation device replacement trolley further includes D. a mount configured to hold the linear movement mechanism. The positioning portion is provided to the mount.
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公开(公告)号：US10524343B2
公开(公告)日：2019-12-31
申请号：US16429331
申请日：2019-06-03
申请人： Gigaphoton Inc.
摘要： An extreme ultraviolet light generation apparatus includes: a chamber; a target supply unit that supplies a droplet of a target substance to a plasma generation region in the chamber; a first pipe at least partly covering a trajectory of the droplet and having a first opened end part as an upstream end part and a second opened end part as a downstream end part in a trajectory direction; a second pipe at least partly covering the first pipe with a gap between the second pipe and the first pipe, and having a third end part, opened and extending downstream of the second end part of the first pipe in the trajectory direction, as a downstream end part in the trajectory direction; and a gas supply unit that supplies gas flowing through the gap and causes the gas to flow in the trajectory direction out of a gas exit.
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