公开(公告)号：USRE48287E1

公开(公告)日：2020-10-27

申请号：US16150286

申请日：2018-10-03

Applicant: ASML Netherlands B.V.

Inventor： Guido De Boer ,  Ralph Van Melle ,  Teunis Van De Peut ,  Henk Derks ,  Frederik Matthias Spiegelhalder ,  Roy Josephus Stephanus Derks ,  Edwin Johannes Theodorus Smulders

IPC: G02B6/32 ,  H01J37/317 ,  B32B37/12 ,  B32B38/00 ,  B82Y10/00 ,  B82Y40/00 ,  G02B6/36 ,  B32B37/14

Abstract: A method for forming an optical fiber array. A substrate having a first surface and an opposing second surface is provided. The substrate is provided with a plurality of apertures extending through the substrate from the first surface to the second surface. In addition, a plurality of fibers are provided. The fibers have fiber ends with a diameter smaller than the smallest diameter of the apertures. A first fiber is inserted in a first corresponding aperture, from the first surface side of the substrate, such that the fiber end is positioned in close proximity of the second surface. The inserted first fiber is bent in a predetermined direction such that the fiber abuts a side wall of the first aperture at a predetermined position. After the first fiber is bent, a second fiber is inserted in a second corresponding aperture, from the first surface side of the substrate, such that the fiber end is positioned in close proximity of the second surface. The inserted second fiber is bent in conformity with a shape of the first fiber, such that the fiber abuts a side wall of the second aperture at a predetermined position. The bent fibers are bonded together using an adhesive material.

公开(公告)号：USRE48903E1

公开(公告)日：2022-01-25

申请号：US16281179

申请日：2019-02-21

Applicant: ASML Netherlands B.V.

Inventor： Vincent Sylvester Kuiper ,  Erwin Slot ,  Marcel Nicolaas Jacobus Van Kervinck ,  Guido De Boer ,  Hendrik Jan De Jong

IPC: G03F7/20 ,  H01L21/677 ,  H01L21/67 ,  G03B27/60 ,  G03B27/58

Abstract: An apparatus for transferring a target, such as a substrate or a substrate support structure onto which a substrate has been clamped, from a substrate transfer system to a vacuum chamber of a lithography system. The apparatus comprises a load lock chamber for transferring the target into and out of the vacuum chamber. The load lock chamber comprises a first wall with a first passage providing access between a robot space and the interior of the load lock chamber, a second wall with a second passage providing access between the interior of the load lock chamber and the vacuum chamber, and plurality of handling robots for transferring the targets comprising: a first handling robot movable within the robot space to access the substrate transfer system and the first passage; and a second handling robot movable within the load lock chamber to access the first passage and the second passage.

公开(公告)号：USRE49488E1

公开(公告)日：2023-04-11

申请号：US16427295

申请日：2019-05-30

Applicant: ASML Netherlands B.V.

Inventor： Guido De Boer ,  Michel Pieter Dansberg ,  Pieter Kruit

IPC: G03F7/20

Abstract: The invention relates to a lithography system, for example for projecting an image or an image pattern on to a target (1) such as a wafer, said target being included in said system by means of a target table (2), clamping means being present for clamping said target on said table. Said clamping means comprises a layer of stationary liquid (3), included at such thickness between target and target table that, provided the material of the liquid (C) and of the respective contacting faces (A, B) of the target (1) and target table (2), a pressure drop (PCap) arises.