公开(公告)号：US12189312B2

公开(公告)日：2025-01-07

申请号：US17799652

申请日：2021-01-26

Applicant: ASML Holding N.V. ,  ASML Netherlands B.V.

Inventor： Roberto B. Wiener ,  Peter Conrad Kochersperger ,  Boris Kogan ,  Martinus Agnes Willem Cuijpers ,  Robert Jeffrey Wade ,  Shaun Evans

IPC: G03F7/00 ,  H01L21/687

Abstract: Embodiments herein describe methods, devices, and systems for a reticle gripper damper and isolation system for handling reticles and reducing vibrations in a reticle handler for lithography apparatuses and systems. A reticle handler apparatus includes a reticle handler arm, a reticle baseplate configured to hold the reticle, and a gripper arranged to connect the reticle baseplate to the reticle handler arm. The gripper includes a static structure that is coupled to the reticle handler arm, an isolation structure that is coupled to the static structure, and one or more damping elements. The gripper is configured to reduce vibrations of the reticle in the reticle handler apparatus using the one or more damping elements.

公开(公告)号：US11333984B2

公开(公告)日：2022-05-17

申请号：US16967794

申请日：2019-02-04

Applicant: ASML Netherlands B.V. ,  ASML Holding N.V.

Inventor： Richard Joseph Bruls ,  Ronald Peter Albright ,  Peter Conrad Kochersperger ,  Victor Antonio Perez-Falcon

IPC: G03F7/20 ,  B08B6/00

Abstract: Methods and systems are described for reducing particles in the vicinity of an electrostatic chuck (300) in which a cleaning reticle or substrate (320) is secured to the chuck, the cleaning reticle or substrate having surfaces partially devoid of conductive material so that an electric field from the chuck can pass through to a volume adjacent the substrate to draw particles (360) in the volume to the surface of the substrate. Voltage supplied to the chuck may have an alternating polarity to enhance the attraction of particles to the surface.

公开(公告)号：US11137694B2

公开(公告)日：2021-10-05

申请号：US16629337

申请日：2018-07-18

Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

Inventor： Yang-Shan Huang ,  Marcel Joseph Louis Boonen ,  Han-Kwang Nienhuys ,  Jacob Brinkert ,  Richard Joseph Bruls ,  Peter Conrad Kochersperger

IPC: G03F7/20

Abstract: A lithographic apparatus that includes an illumination system that conditions a radiation beam, a first stationary plate having a first surface, and a reticle stage defining, along with the first stationary plate, a first chamber. The reticle stage supports a reticle in the first chamber, and the reticle stage includes a first surface spaced apart from a second surface of the first stationary plate, thereby defining a first gap configured to suppress an amount of contamination passing from a second chamber to the first chamber. The first stationary plate is between the reticle stage and both the illumination system and a projection system configured to project a pattern imparted to the radiation beam by the patterning device onto a substrate.