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公开(公告)号：US11635696B2
公开(公告)日：2023-04-25
申请号：US17120506
申请日：2020-12-14
Applicant: ASML NETHERLANDS B.V.
Inventor： Catharinus De Schiffart , Michael Jozef Mathijs Renkens , Gerard Van Schothorst , Andre Bernardus Jeunink , Gregor Edward Van Baars , Sander Frederik Wuister , Yvonne Wendela Kruijt-Stegeman , Norbert Erwin Therenzo Jansen , Toon Hardeman , George Arie Jan De Fockert , Johan Frederik Dijksman
Abstract: An imprint lithography apparatus having a first frame to be mounted on a floor, a second frame mounted on the first frame via a kinematic coupling, an alignment sensor mounted on the second frame, to align an imprint lithography template arrangement with a target portion of a substrate, and a position sensor to measure a position of the imprint lithography template arrangement and/or a substrate stage relative to the second frame.
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公开(公告)号：US09958774B2
公开(公告)日：2018-05-01
申请号：US15258903
申请日：2016-09-07
Applicant: ASML NETHERLANDS B.V.
Inventor： Arie Jeffrey Den Boef , Andre Bernardus Jeunink , Sander Frederik Wuister , Yvonne Wendela Kruijt-Stegeman
CPC classification number: G03F7/0002 , B82Y10/00 , B82Y40/00 , G03F9/7042
Abstract: A method of determining a position of an imprint template in an imprint lithography apparatus is disclosed. In an embodiment, the method includes illuminating an area of the imprint template in which an alignment mark is expected to be found by scanning an alignment radiation beam over that area, detecting an intensity of radiation reflected or transmitted from the area, and identifying the alignment mark via analysis of the detected intensity.
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公开(公告)号：US20140199485A1
公开(公告)日：2014-07-17
申请号：US14222013
申请日：2014-03-21
Applicant: ASML NETHERLANDS B.V.
Inventor： Ivar SCHRAM , Johan Frederik Dijksman , Sander Frederik Wuister , Yvonne Wendela Kruijt-Stegeman , Jeroen Herman Lammers
IPC: B05D5/00
CPC classification number: B05D5/00 , B82Y10/00 , B82Y40/00 , G03F7/0002
Abstract: A method of depositing an imprintable medium onto a target area of a substrate for imprint lithography is disclosed. The method includes moving the substrate, a print head comprising a nozzle to eject an imprintable medium onto the substrate, or both, relative to the other in a first direction across the target area while ejecting a first series of droplets of imprintable medium onto the substrate and moving the substrate, the print head; or both, relative to the other in a second opposing direction across the target area while ejecting a second series of droplets of imprintable medium onto the substrate on or adjacent to droplets from the first series of droplets.
Abstract translation: 公开了一种将可压印介质沉积到用于压印光刻的基板的目标区域上的方法。 该方法包括移动基板，包括喷嘴的打印头，以在横过目标区域的第一方向上相对于另一方弹出可压印介质，同时将可压印介质的第一系列液滴喷射到基板上 并移动基板，打印头; 或两者相对于另一个在相对于目标区域的第二相对方向上，同时在第一系列液滴上或邻近液滴上喷射可压印介质的第二系列液滴到基板上。
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公开(公告)号：US09889597B2
公开(公告)日：2018-02-13
申请号：US14076793
申请日：2013-11-11
Applicant: ASML NETHERLANDS B.V.
Inventor： Yvonne Wendela Kruijt-Stegeman , Raymond Jacobus Wilhelmus Knaapen , Johan Frederik Dijksman , Sander Frederik Wuister , Ivar Schram , Raymond Wilhelmus Louis Lafarre
CPC classification number: B29C59/002 , B29C59/02 , B82Y10/00 , B82Y40/00 , G03F7/0002
Abstract: An imprint lithography apparatus is disclosed that includes a support structure configured to hold an imprint template. The apparatus further includes an actuator located between the support structure and a side of the imprint template, when the imprint template is held by the support structure, configured to apply a force to the imprint template and a force sensor between the support structure and a side of the imprint template, when the imprint template is held by the support structure.
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公开(公告)号：US09610727B2
公开(公告)日：2017-04-04
申请号：US14304662
申请日：2014-06-13
Applicant: ASML NETHERLANDS B.V.
Inventor： Yvonne Wendela Kruijt-Stegeman , Johan Frederik Dijksman , Aleksey Yurievich Kolesnychenko , Karel Diederick Van Der Mast , Klaus Simon , Raymond Jacobus Wilhelmus Knaapen , Krassimir Todorov Krastev , Sander Frederik Wuister
CPC classification number: B29C59/02 , B29C35/0888 , B29C59/022 , B29C2035/0827 , B29C2059/023 , B82Y10/00 , B82Y40/00 , G03F7/0002
Abstract: An imprint lithography apparatus is disclosed that has a first array of template holders, a second array of template holders, and a substrate table arranged to support a substrate to be imprinted, wherein the first array of template holders is arranged to hold an array of imprint templates that can be used to imprint a first array of patterns onto the substrate, and the second array of template holders is arranged hold an array of imprint templates that can be used to imprint a second array of patterns onto the substrate, the patterns imprinted by the second array being interspersed between the patterns imprinted by the first array.
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Patent Agency Ranking
公开(公告)号：US20150136324A1
公开(公告)日：2015-05-21
申请号：US14605637
申请日：2015-01-26
Applicant: ASML NETHERLANDS B.V.
Inventor： Sander Frederik WUISTER , Vadim Yevgenyevich Banine , Johan Frederik Dijksman , Yvonne Wendela Kruijt-Stegeman , Jeroen Herman Lammers , Roelof Koole
CPC classification number: B29C43/34 , B29C43/021 , B29C43/58 , B29C2043/025 , B29K2101/12 , B44C1/20 , B82Y10/00 , B82Y40/00 , G03F7/0002
Abstract: In an embodiment, there is provided an imprint lithography method that includes providing a first amount of imprintable medium on a first area of a substrate, the first amount of imprintable medium, when fixed, having a first etch rate; and providing a second amount of imprintable medium on a second, different area of the substrate, the second amount of imprintable medium, when fixed, having a second, different etch rate.
Abstract translation: 在一个实施例中，提供了压印光刻方法，其包括在衬底的第一区域上提供第一量的可压印介质，当固定时，第一量的可压印介质具有第一蚀刻速率; 以及在所述基板的第二不同区域上提供第二量的可压印介质，所述第二量的可压印介质在固定时具有第二不同的蚀刻速率。
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公开(公告)号：US10908510B2
公开(公告)日：2021-02-02
申请号：US16550451
申请日：2019-08-26
Applicant: ASML NETHERLANDS B.V.
Inventor： Catharinus De Schiffart , Michael Jozef Mathijs Renkens , Gerard Van Schothorst , Andre Bernardus Jeunink , Gregor Edward Van Baars , Sander Frederik Wuister , Yvonne Wendela Kruijt-Stegeman , Norbert Erwin Therenzo Jansen , Toon Hardeman , George Arie Jan De Fockert , Johan Frederik Dijksman
Abstract: An imprint lithography apparatus having a first frame to be mounted on a floor, a second frame mounted on the first frame via a kinematic coupling, an alignment sensor mounted on the second frame, to align an imprint lithography template arrangement with a target portion of a substrate, and a position sensor to measure a position of the imprint lithography template arrangement and/or a substrate stage relative to the second frame.
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公开(公告)号：US09662678B2
公开(公告)日：2017-05-30
申请号：US14222013
申请日：2014-03-21
Applicant: ASML NETHERLANDS B.V.
Inventor： Ivar Schram , Johan Frederik Dijksman , Sander Frederik Wuister , Yvonne Wendela Kruijt-Stegeman , Jeroen Herman Lammers
CPC classification number: B05D5/00 , B82Y10/00 , B82Y40/00 , G03F7/0002
Abstract: A method of depositing an imprintable medium onto a target area of a substrate for imprint lithography is disclosed. The method includes moving the substrate, a print head comprising a nozzle to eject an imprintable medium onto the substrate, or both, relative to the other in a first direction across the target area while ejecting a first series of droplets of imprintable medium onto the substrate and moving the substrate, the print head, or both, relative to the other in a second opposing direction across the target area while ejecting a second series of droplets of imprintable medium onto the substrate on or adjacent to droplets from the first series of droplets.
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公开(公告)号：US12147162B2
公开(公告)日：2024-11-19
申请号：US18124350
申请日：2023-03-21
Applicant: ASML NETHERLANDS B.V.
Inventor： Catharinus De Schiffart , Michael Jozef Mathijs Renkens , Gerard Van Schothorst , Andre Bernardus Jeunink , Gregor Edward Van Baars , Sander Frederik Wuister , Yvonne Wendela Kruijt-Stegeman , Norbert Erwin Therenzo Jansen , Toon Hardeman , George Arie Jan De Fockert , Johan Frederik Dijksman
Abstract: An imprint lithography apparatus having a first frame to be mounted on a floor, a second frame mounted on the first frame via a kinematic coupling, an alignment sensor mounted on the second frame, to align an imprint lithography template arrangement with a target portion of a substrate, and a position sensor to measure a position of the imprint lithography template arrangement and/or a substrate stage relative to the second frame.
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公开(公告)号：US10890851B2
公开(公告)日：2021-01-12
申请号：US15828523
申请日：2017-12-01
Applicant: ASML NETHERLANDS B.V.
Inventor： Catharinus De Schiffart , Michael Jozef Mathijs Renkens , Gerard Van Schothorst , Andre Bernardus Jeunink , Gregor Edward Van Baars , Sander Frederik Wuister , Yvonne Wendela Kruijt-Stegeman , Norbert Erwin Therenzo Jansen , Toon Hardeman , George Arie Jan De Fockert , Johan Frederik Dijksman
Abstract: An imprint lithography apparatus having a first frame to be mounted on a floor, a second frame mounted on the first frame via a kinematic coupling, an alignment sensor mounted on the second frame, to align an imprint lithography template arrangement with a target portion of a substrate, and a position sensor to measure a position of the imprint lithography template arrangement and/or a substrate stage relative to the second frame.
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