公开(公告)号：US20200088657A1

公开(公告)日：2020-03-19

申请号：US16470928

申请日：2017-12-04

Applicant: ASML Netherlands B.V.

Inventor： Chiyan KUAN

IPC: G01N23/225 ,  H01J37/22

Abstract: Systems and methods are provided for dynamically compensating position errors of a sample. The system can comprise one or more sensing units configured to generate a signal based on a position of a sample and a controller. The controller can be configured to determine the position of the sample based on the signal and in response to the determined position, provide information associated with the determined position for control of one of a first handling unit in a first chamber, a second handling unit in a second chamber, and a beam location unit in the second chamber.

公开(公告)号：US20230005698A1

公开(公告)日：2023-01-05

申请号：US17778579

申请日：2020-10-21

Applicant: ASML NETHERLANDS B.V.

Inventor： Tianming CHEN ,  Chiyan KUAN ,  Yixiang WANG ,  Zhi Po WANG

IPC: H01J37/02 ,  G03F7/20

Abstract: A system for grounding a mask using a grounding component are provided. Some embodiments of the system include a grounding component comprising a base and an extension protruding from the base and comprising a conductive prong configured to contact a conductive layer of the mask. Some embodiments of the system include a plurality of conductive prongs configured to contact multiple positions of a conductive layer of the mask. Some other embodiments of the system include an extension comprising various shapes.

公开(公告)号：US20200286710A1

公开(公告)日：2020-09-10

申请号：US16652397

申请日：2018-09-25

Applicant: ASML Netherlands B.V.

Inventor： Zhong-wei CHEN ,  Jack JAU ,  Wei FANG ,  Chiyan KUAN

IPC: H01J37/28 ,  H01L21/67

Abstract: Disclosed herein is a method comprising: determining parameters of a recipe of charged particle beam inspection of a region on a sample, based on a second set of characteristics of the sample; inspecting the region using the recipe.