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1.Cleaning composition and method of manufacturing metal wiring using the same 有权
Title translation: 使用其制造金属布线的清洁组合物和方法公开(公告)号:US09340759B2
公开(公告)日:2016-05-17
申请号:US14264193
申请日:2014-04-29
Applicant: Samsung Display Co., Ltd. , Cowon Innotech Inc.
Inventor: Bong-Yeon Kim , Jin-Ho Ju , Jun-Hyuk Woo , Jung-Hwan Song , Seok-Ho Lee , Seong-Sik Jeon , Jong-Su Han
IPC: C09K13/04 , C11D11/00 , H01L21/02 , H05K3/26 , C11D7/32 , C11D7/26 , C11D7/08 , C11D7/06 , H05K3/06 , H05K1/03 , H05K3/38
CPC classification number: C23F1/16 , C11D7/06 , C11D7/08 , C11D7/265 , C11D7/3209 , C11D7/3245 , C11D11/0047 , C23F11/04 , H01L21/02068 , H05K1/0306 , H05K3/064 , H05K3/26 , H05K3/388 , H05K2201/0317 , H05K2201/0341 , H05K2203/124 , H05K2203/125
Abstract: A cleaning composition includes about 0.01 to about 5 wt % of a chelating agent; about 0.01 to about 0.5 wt % of an organic acid; about 0.01 to about 1.0 wt % of an inorganic acid; about 0.01 to about 5 wt % of an alkali compound; and deionized water.
Abstract translation: 清洁组合物包含约0.01至约5重量%的螯合剂; 约0.01至约0.5重量%的有机酸; 约0.01至约1.0重量%的无机酸; 约0.01至约5重量%的碱金属化合物; 和去离子水。
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2.CLEANING COMPOSITION AND METHOD OF MANUFACTURING METAL WIRING USING THE SAME 有权
Title translation: 清洁组合物及使用其制造金属接线的方法公开(公告)号:US20150136728A1
公开(公告)日:2015-05-21
申请号:US14264193
申请日:2014-04-29
Applicant: Samsung Display Co., Ltd. , Cowon Innotech Inc.
Inventor: Bong-Yeon Kim , Jin-Ho Ju , Jun-Hyuk Woo , Jung-Hwan Song , Seok-Ho Lee , Seong-Sik Jeon , Jong-Su Han
CPC classification number: C23F1/16 , C11D7/06 , C11D7/08 , C11D7/265 , C11D7/3209 , C11D7/3245 , C11D11/0047 , C23F11/04 , H01L21/02068 , H05K1/0306 , H05K3/064 , H05K3/26 , H05K3/388 , H05K2201/0317 , H05K2201/0341 , H05K2203/124 , H05K2203/125
Abstract: A cleaning composition includes about 0.01 to about 5 wt % of a chelating agent; about 0.01 to about 0.5 wt % of an organic acid; about 0.01 to about 1.0 wt % of an inorganic acid; about 0.01 to about 5 wt % of an alkali compound; and deionized water.
Abstract translation: 清洁组合物包含约0.01至约5重量%的螯合剂; 约0.01至约0.5重量%的有机酸; 约0.01至约1.0重量%的无机酸; 约0.01至约5重量%的碱金属化合物; 和去离子水。
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