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公开(公告)号:CN103608907B
公开(公告)日:2017-03-29
申请号:CN201280026102.X
申请日:2012-05-29
Applicant: 住友电木株式会社
CPC classification number: H01L23/49513 , C09J7/35 , C09J11/04 , H01L23/3107 , H01L24/29 , H01L24/32 , H01L24/73 , H01L24/83 , H01L2224/2929 , H01L2224/29311 , H01L2224/29318 , H01L2224/29324 , H01L2224/29339 , H01L2224/29344 , H01L2224/29347 , H01L2224/29355 , H01L2224/29364 , H01L2224/29386 , H01L2224/2939 , H01L2224/29439 , H01L2224/29499 , H01L2224/32145 , H01L2224/32225 , H01L2224/32245 , H01L2224/48091 , H01L2224/48247 , H01L2224/48465 , H01L2224/73265 , H01L2224/83192 , H01L2224/83201 , H01L2224/83862 , H01L2224/92247 , H01L2924/10253 , H01L2924/12042 , H01L2924/15747 , H01L2924/00014 , H01L2924/0665 , H01L2924/05432 , H01L2924/05442 , H01L2924/00 , H01L2924/00012
Abstract: 根据本发明,提供导电性良好的半导体装置。本发明的半导体装置(10)具备:基材(2);半导体元件(3);和介于基材(2)与半导体元件(3)之间,将两者粘接的粘接层(1)。该半导体装置10),在粘接层(1)中分散有金属颗粒和绝缘颗粒,金属颗粒具有鳞片形状或椭球形状。在将粘接层(1)中的金属颗粒的体积含有率设为a,并将粘接层(1)中的绝缘颗粒的体积含有率设为b时,粘接层(1)中的填料的体积含有率(a+b)为0.20以上0.50以下,填料中的金属颗粒的体积含有率a/(a+b)为0.03以上0.70以下。
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公开(公告)号:CN103608907A
公开(公告)日:2014-02-26
申请号:CN201280026102.X
申请日:2012-05-29
Applicant: 住友电木株式会社
CPC classification number: H01L23/49513 , C09J7/35 , C09J11/04 , H01L23/3107 , H01L24/29 , H01L24/32 , H01L24/73 , H01L24/83 , H01L2224/2929 , H01L2224/29311 , H01L2224/29318 , H01L2224/29324 , H01L2224/29339 , H01L2224/29344 , H01L2224/29347 , H01L2224/29355 , H01L2224/29364 , H01L2224/29386 , H01L2224/2939 , H01L2224/29439 , H01L2224/29499 , H01L2224/32145 , H01L2224/32225 , H01L2224/32245 , H01L2224/48091 , H01L2224/48247 , H01L2224/48465 , H01L2224/73265 , H01L2224/83192 , H01L2224/83201 , H01L2224/83862 , H01L2224/92247 , H01L2924/10253 , H01L2924/12042 , H01L2924/15747 , H01L2924/00014 , H01L2924/0665 , H01L2924/05432 , H01L2924/05442 , H01L2924/00 , H01L2924/00012 , H01L23/295 , H01B1/22 , H01L2224/83855
Abstract: 根据本发明,提供导电性良好的半导体装置。本发明的半导体装置(10)具备:基材(2);半导体元件(3);和介于基材(2)与半导体元件(3)之间,将两者粘接的粘接层(1)。该半导体装置(10),在粘接层(1)中分散有金属颗粒和绝缘颗粒,金属颗粒具有鳞片形状或椭球形状。在将粘接层(1)中的金属颗粒的体积含有率设为a,并将粘接层(1)中的绝缘颗粒的体积含有率设为b时,粘接层(1)中的填料的体积含有率(a+b)为0.20以上0.50以下,填料中的金属颗粒的体积含有率a/(a+b)为0.03以上0.70以下。
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