Invention Grant
- Patent Title: Passivation of laser facets and systems for performing the same
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Application No.: US15133334Application Date: 2016-04-20
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Publication No.: US09972968B2Publication Date: 2018-05-15
- Inventor: Qiang Zhang , Haiyan An , Hans Georg Treusch
- Applicant: Trumpf Photonics, Inc.
- Applicant Address: US NJ Cranbury
- Assignee: Trumpf Photonics, Inc.
- Current Assignee: Trumpf Photonics, Inc.
- Current Assignee Address: US NJ Cranbury
- Agency: Fish & Richardson P.C.
- Main IPC: H01S5/02
- IPC: H01S5/02 ; H01S5/028 ; H01S5/343 ; H01S5/10 ; H01J37/32 ; C30B23/06 ; C30B29/48 ; C23C14/46

Abstract:
Methods of passivating at least one facet of a multilayer waveguide structure can include: cleaning, in a first chamber of a multi-chamber ultra-high vacuum (UHV) system, a first facet of the multilayer waveguide structure; transferring the cleaned multilayer waveguide structure from the first chamber to a second chamber of the multi-chamber UHV system; forming, in the second chamber, a first single crystalline passivation layer on the first facet; transferring the multilayer waveguide structure from the second chamber to a third chamber of the multi-chamber UHV system; and forming, in the third chamber, a first dielectric coating on the first single crystalline passivation layer, in which the methods are performed in an UHV environment of the multi-chamber UHV system without removing the multilayer waveguide structure from the UHV environment.
Public/Granted literature
- US20170310077A1 Passivation of Laser Facets and Systems for Performing the Same Public/Granted day:2017-10-26
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