发明授权
- 专利标题: Physical vapor deposition system using rotating pallet with X and Y positioning
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申请号: US14923348申请日: 2015-10-26
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公开(公告)号: US09957606B2公开(公告)日: 2018-05-01
- 发明人: Ravi Mullapudi , Srikanth Dasaradhi , Lee LaBlanc , Suresh Palanisamy , Venkata Dora Chowdary Kakarla
- 申请人: Tango Systems, Inc.
- 申请人地址: US CA San Jose
- 专利权人: Tango Systems Inc.
- 当前专利权人: Tango Systems Inc.
- 当前专利权人地址: US CA San Jose
- 代理机构: Patent Law Group LLP
- 代理商 Brian D. Ogonowsky
- 主分类号: C23C14/34
- IPC分类号: C23C14/34 ; C23C14/50 ; C23C14/54 ; H01J37/34 ; H01J37/32 ; C23C14/35 ; C23C14/56 ; C23C14/08
摘要:
A circular PVD chamber has a plurality of sputtering targets mounted on a top wall of the chamber. A pallet in the chamber is coupled to a motor for rotating the pallet about its center axis. The pallet has a diameter less than the diameter of the circular chamber. The pallet is also shiftable in an XY direction to move the center of the pallet beneath any of the targets so all areas of a workpiece supported by the pallet can be positioned directly below any one of the targets. A scanning magnet is in back of each target and is moved, via a programmed controller, to only be above portions of the workpiece so that no sputtered material is wasted. For depositing a material onto small workpieces, a cooling backside gas volume is created between the pallet and the underside of sticky tape supporting the workpieces.
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