- 专利标题: Wafer processing method
-
申请号: US15341624申请日: 2016-11-02
-
公开(公告)号: US09953871B2公开(公告)日: 2018-04-24
- 发明人: Tsubasa Obata , Yohei Yamashita
- 申请人: DISCO CORPORATION
- 申请人地址: JP Tokyo
- 专利权人: DISCO CORPORATION
- 当前专利权人: DISCO CORPORATION
- 当前专利权人地址: JP Tokyo
- 代理机构: Greer Burns & Crain, Ltd.
- 优先权: JP2015-217275 20151105
- 主分类号: H01L21/78
- IPC分类号: H01L21/78 ; H01L21/302 ; H01L21/304 ; H01L21/56 ; H01L21/683 ; H01L23/31 ; H01L21/268
摘要:
A laser beam is applied to the front side of a wafer along division lines, to form grooves having a depth corresponding to a finished thickness of device chips. Molding resin is laid on the front side of the wafer and embedded in the grooves. A protective member is attached to a front side of the molding resin, and a back side of the wafer is ground to expose the grooves and to expose the molding resin embedded in the grooves on the back side of the wafer. The wafer is divided along the grooves by a cutting blade having a thickness smaller than the width of the grooves, a central portion in a width direction of the molding resin being exposed along the grooves, thereby dividing the wafer into individual device chips each having a periphery surrounded with the molding resin.
公开/授权文献
- US20170133269A1 WAFER PROCESSING METHOD 公开/授权日:2017-05-11
信息查询
IPC分类: