Invention Grant
- Patent Title: Polishing pad with secondary window seal
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Application No.: US14594661Application Date: 2015-01-12
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Publication No.: US09731397B2Publication Date: 2017-08-15
- Inventor: Rajkumar Alagarsamy , Yongqi Hu , Simon Yavelberg , Periya Gopalan , Christopher R. Mahon
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Fish & Richardson P.C.
- Main IPC: B24B37/20
- IPC: B24B37/20 ; B24B49/12

Abstract:
A polishing article has a polishing surface and an aperture, the aperture including a first section and a second section. The polishing article includes a projection extending inwardly into the aperture. The polishing article includes a lower portion on a side of the first surface farther from the polishing surface. A window has a first portion positioned in the first section of the aperture and a second portion extending into the second section of the aperture. The window has a second surface substantially parallel to the polishing surface. A first adhesive adheres the first surface of the projection to the second surface of the window to secure the window to the projection and a second adhesive of different material composition than the first adhesive. The second adhesive is positioned laterally between the second portion of the window and the lower portion of the polishing article.
Public/Granted literature
- US20150126100A1 Polishing Pad with Secondary Window Seal Public/Granted day:2015-05-07
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