- 专利标题: High electron mobility transistor structure
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申请号: US14855460申请日: 2015-09-16
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公开(公告)号: US09728613B2公开(公告)日: 2017-08-08
- 发明人: Fu-Wei Yao , Chun-Wei Hsu , Chen-Ju Yu , Jiun-Lei Jerry Yu , Fu-Chih Yang , Chih-Wen Hsiung , King-Yuen Wong
- 申请人: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- 申请人地址: TW Hsin-Chu
- 专利权人: Taiwan Semiconductor Manufacturing Company, Ltd.
- 当前专利权人: Taiwan Semiconductor Manufacturing Company, Ltd.
- 当前专利权人地址: TW Hsin-Chu
- 代理机构: Haynes and Boone, LLP
- 主分类号: H01L29/66
- IPC分类号: H01L29/66 ; H01L29/40 ; H01L29/778 ; H01L29/20
摘要:
A transistor includes a first layer over a substrate. The transistor also includes a second layer over the first layer. The transistor further includes a carrier channel layer at an interface of the first layer and the second layer. The transistor additionally includes a gate structure, a drain, and a source over the second layer. The transistor also includes a passivation material in the second layer between an edge of the gate structure and an edge of the drain in a top-side view. The carrier channel layer has a smaller surface area than the first layer between the edge of the gate structure and the edge of the drain in the top-side view.
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