Invention Grant
- Patent Title: Memory device
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Application No.: US14676819Application Date: 2015-04-02
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Publication No.: US09646711B2Publication Date: 2017-05-09
- Inventor: Hyun-Min Choi , Shigenobu Maeda
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR Samsung-ro, Yeongtong-gu, Suwon-si, Gyeonggi-do
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR Samsung-ro, Yeongtong-gu, Suwon-si, Gyeonggi-do
- Agency: Muir Patent Law, PLLC
- Priority: KR10-2014-0079073 20140626
- Main IPC: G11C5/02
- IPC: G11C5/02 ; G11C17/16 ; H01L23/525 ; H01L27/112

Abstract:
A memory device includes first through fourth active regions arranged sequentially along a first direction, and which extend along a second direction different from the first direction; a first gate electrode formed on the first through fourth active regions to intersect the first through fourth active regions, and extending along the first direction; a second gate electrode formed on the first through fourth active regions to intersect the first through fourth active regions, extending along the second direction, and arranged so that no other gate electrodes are between the first gate electrode and the second gate electrode in the second direction; the first gate electrode extending between a first end and a second end;a first wiring line which is formed on the first gate electrode; a first strap contact, which connects the first wiring line and the first gate electrode between the first active region and the second active region; and a second strap contact, which connects the first wiring line and the first gate electrode between the third active region and the fourth active region.
Public/Granted literature
- US20150380102A1 MEMORY DEVICE Public/Granted day:2015-12-31
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