Invention Grant
- Patent Title: Electron beam imaging with dual Wien-filter monochromator
- Patent Title (中): 电子束成像与双维恩滤光片单色仪
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Application No.: US14711607Application Date: 2015-05-13
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Publication No.: US09443696B2Publication Date: 2016-09-13
- Inventor: Xinrong Jiang , Liqun Han
- Applicant: KLA-Tencor Corporation
- Applicant Address: US CA Milpitas
- Assignee: KLA-Tencor Corporation
- Current Assignee: KLA-Tencor Corporation
- Current Assignee Address: US CA Milpitas
- Agency: Okamoto & Benedicto LLP
- Main IPC: H01J37/26
- IPC: H01J37/26 ; H01J37/05 ; H01J37/06 ; H01J37/10 ; H01J37/28

Abstract:
One embodiment relates to a dual Wien-filter monochromator. A first Wien filter focuses an electron beam in a first plane while leaving the electron beam to be parallel in a second plane. A slit opening allows electrons of the electron beam having an energy within an energy range to pass through while blocking electrons of the electron beam having an energy outside the energy range. A second Wien filter focuses the electron beam to become parallel in the first plane while leaving the electron beam to be parallel in the second plane. Other embodiments, aspects and features are also disclosed.
Public/Granted literature
- US20150340200A1 ELECTRON BEAM IMAGING WITH DUAL WIEN-FILTER MONOCHROMATOR Public/Granted day:2015-11-26
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