Invention Grant
- Patent Title: Solid-state imaging device and method of manufacturing the same
- Patent Title (中): 固态成像装置及其制造方法
-
Application No.: US14194422Application Date: 2014-02-28
-
Publication No.: US09343495B2Publication Date: 2016-05-17
- Inventor: Takaaki Minami , Shoichi Hirooka
- Applicant: KABUSHIKI KAISHA TOSHIBA
- Applicant Address: JP Tokyo
- Assignee: KABUSHIKI KAISHA TOSHIBA
- Current Assignee: KABUSHIKI KAISHA TOSHIBA
- Current Assignee Address: JP Tokyo
- Agency: Patterson & Sheridan, LLP
- Priority: JP2013-155182 20130726
- Main IPC: H01L31/062
- IPC: H01L31/062 ; H01L31/113 ; H01L27/146

Abstract:
A solid-state imaging device includes a semiconductor layer, a reflector, and a plurality of element separating regions. In the semiconductor layer, a plurality of photoelectric conversion elements is arranged in a two-dimensional array. The reflector covers a surface of the semiconductor layer on a side opposite to a surface of the semiconductor layer on which alight is incident, and reflects the light. The element separating regions are formed in the semiconductor layer to physically and electrically separate the plurality of photoelectric conversion elements. Each of the element separating regions extend from the surface of the semiconductor layer on which the light is incident to the reflector and has a reflection surface for reflecting light.
Public/Granted literature
- US20150028405A1 SOLID-STATE IMAGING DEVICE AND METHOD OF MANUFACTURING THE SAME Public/Granted day:2015-01-29
Information query
IPC分类: