Invention Grant
- Patent Title: Lithographic apparatus, substrate and device manufacturing method
- Patent Title (中): 平版印刷设备,基板和器件制造方法
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Application No.: US13853407Application Date: 2013-03-29
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Publication No.: US09261772B2Publication Date: 2016-02-16
- Inventor: Richard Quintanilha
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox, P.L.L.C.
- Main IPC: G03B27/54
- IPC: G03B27/54 ; G03F1/00 ; G01N21/93 ; G03F7/20 ; G01N21/956

Abstract:
A method uses a lithographic apparatus to form an inspection target structure upon a substrate. The method comprises forming the periphery of the inspection target structure so as to provide a progressive optical contrast transition between the inspection target structure and its surrounding environment. This may be achieved by providing a progressive change in the optical index at the periphery of the target structure.
Public/Granted literature
- US20130271740A1 Lithographic Apparatus, Substrate and Device Manufacturing Method Public/Granted day:2013-10-17
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