发明授权
US09209092B2 Semiconductor device with a wide-gap semiconductor layer on inner wall of trench
有权
半导体器件在沟槽内壁上具有宽间隙半导体层
- 专利标题: Semiconductor device with a wide-gap semiconductor layer on inner wall of trench
- 专利标题(中): 半导体器件在沟槽内壁上具有宽间隙半导体层
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申请号: US13354599申请日: 2012-01-20
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公开(公告)号: US09209092B2公开(公告)日: 2015-12-08
- 发明人: Shunpei Yamazaki , Hiromichi Godo
- 申请人: Shunpei Yamazaki , Hiromichi Godo
- 申请人地址: JP Atsugi-shi, Kanagawa-ken
- 专利权人: Semiconductor Energy Laboratory Co., Ltd.
- 当前专利权人: Semiconductor Energy Laboratory Co., Ltd.
- 当前专利权人地址: JP Atsugi-shi, Kanagawa-ken
- 代理机构: Robinson Intellectual Property Law Office, P.C.
- 代理商 Eric J. Robinson
- 优先权: JP2011-014628 20110126; JP2011-112673 20110519
- 主分类号: H01L29/66
- IPC分类号: H01L29/66 ; H01L29/739 ; H01L29/78 ; H01L21/84 ; H01L27/06 ; H01L27/115 ; H01L27/12 ; H01L49/02 ; H01L29/423 ; H01L29/786
摘要:
A conventional DRAM needs to be refreshed at an interval of several tens of milliseconds to hold data, which results in large power consumption. In addition, a transistor therein is frequently turned on and off; thus, deterioration of the transistor is also a problem. These problems become significant as the memory capacity increases and transistor miniaturization advances. A transistor is provided which includes a wide-gap semiconductor and has a trench structure including a trench for a gate electrode and a trench for element isolation. Even when the distance between a source electrode and a drain electrode is decreased, the occurrence of a short-channel effect can be suppressed by setting the depth of the trench for the gate electrode as appropriate.
公开/授权文献
- US20120187475A1 SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF 公开/授权日:2012-07-26
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