Invention Grant
- Patent Title: Method for manufacturing ion optical device
- Patent Title (中): 离子光学器件的制造方法
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Application No.: US14094132Application Date: 2013-12-02
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Publication No.: US09192053B2Publication Date: 2015-11-17
- Inventor: Hui Mu , Gongyu Jiang , Li Ding , Jianliang Li , Wenjian Sun
- Applicant: SHIMADZU RESEARCH LABORATORY (SHANGHAI) CO. LTD.
- Applicant Address: CN Shanghai
- Assignee: SHIMADZU RESEARCH LABORATORY (SHANGHAI) CO. LTD.
- Current Assignee: SHIMADZU RESEARCH LABORATORY (SHANGHAI) CO. LTD.
- Current Assignee Address: CN Shanghai
- Agency: Locke Lord LLP
- Agent Tim Tingkang Xia, Esq.
- Priority: CN201110146810 20110601
- Main IPC: B05D5/12
- IPC: B05D5/12 ; H05K3/10 ; B05D3/00 ; C23C14/34 ; H01J49/06 ; H01J49/42 ; H01J37/04 ; C23C14/00 ; C23C18/18 ; C23C14/04 ; H05K1/11 ; H05K3/00 ; H05K3/14

Abstract:
The present invention provides a method for preparing an ion optical device. A substrate is fabricated with a hard material adapted for a grinding process, the substrate at least including a planar surface, and including at least one insulating material layer. Next, one or more linear grooves are cut on the planar surface, to form multiple discrete ion optical electrode regions on the planar surface separated by the linear grooves. Then, conductive leads are fabricated on other substrate surfaces than the planar surface and in a through hole inside the substrate, to provide voltages required on ion optical electrodes. By using high-hardness materials in cooperation with high-precision machining, higher precision and a desired discrete electrode contour can be obtained.
Public/Granted literature
- US20140087063A1 METHOD FOR MANUFACTURING ION OPTICAL DEVICE Public/Granted day:2014-03-27
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