发明授权
- 专利标题： Etching composition and method of manufacturing a display substrate using the system
- 专利标题（中）： 蚀刻组合物及其制造方法
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申请号： US13534502申请日： 2012-06-27
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公开(公告)号： US09062244B2公开(公告)日： 2015-06-23
- 发明人: Hong-Sick Park , Wang-Woo Lee , Bong-Kyun Kim , O-Byoung Kwon , Kyung-Bo Shim , Sang-Hoon Jang
- 申请人： Hong-Sick Park , Wang-Woo Lee , Bong-Kyun Kim , O-Byoung Kwon , Kyung-Bo Shim , Sang-Hoon Jang
- 申请人地址： KR KR
- 专利权人： SAMSUNG DISPLAY CO., LTD.,DONGWOO FINE-CHEM CO., LTD.
- 当前专利权人： SAMSUNG DISPLAY CO., LTD.,DONGWOO FINE-CHEM CO., LTD.
- 当前专利权人地址： KR KR
- 代理机构： Innovation Counsel LLP
- 优先权： KR10-2011-0115783 20111108
- 主分类号： H01L21/302
- IPC分类号： H01L21/302 ; H01L21/461 ; C09K13/04 ; C23F1/18 ; C23F1/02 ; C23F1/38 ; C23F1/44 ; C09K13/08 ; H01L21/3213 ; H01L27/12
摘要：
An etching composition and a method of manufacturing a display substrate using the etching composition are disclosed. The etching composition includes phosphoric acid (H3PO4) of about 40% by weight to about 70% by weight, nitric acid (HNO3) of about 5% by weight to about 15% by weight, acetic acid (CH3COOH) of about 5% by weight to about 20% by weight, and a remainder of water. Thus, a metal layer including copper may be stably etched.
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