发明授权
- 专利标题： Electrostatic chuck
- 专利标题（中）： 静电吸盘
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申请号： US13816037申请日： 2011-08-11
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公开(公告)号： US09030798B2公开(公告)日： 2015-05-12
- 发明人: Kaduko Ishikawa , Junji Yonezawa , Toshihiro Aoshima , Yoshihide Hayashida
- 申请人： Kaduko Ishikawa , Junji Yonezawa , Toshihiro Aoshima , Yoshihide Hayashida
- 申请人地址： JP Fukuoka
- 专利权人： Toto Ltd.
- 当前专利权人： Toto Ltd.
- 当前专利权人地址： JP Fukuoka
- 代理机构： Carrier Blackman & Associates, P.C.
- 代理商 Joseph P. Carrier; William D. Blackman
- 优先权： JP2010-180604 20100811; JP2011-171021 20110804
- 国际申请： PCT/JP2011/068400 WO 20110811
- 国际公布： WO2012/020831 WO 20120216
- 主分类号： H01L21/683
- IPC分类号： H01L21/683 ; B32B3/30 ; B32B5/14 ; H01L21/687 ; H02N13/00 ; B23Q3/15
摘要：
An electrostatic chuck comprises: a dielectric substrate having a protrusion and a planar surface part. The protrusion is formed on a major surface of the dielectric substrate. An adsorption target material is mounted on the major surface. The planar surface part is formed in a periphery of the protrusion. The dielectric substrate is formed from a polycrystalline ceramics sintered body. A top face of the protrusion is a curved surface, and a first recess is formed in the top face to correspond to crystal grains that appear on the surface. The planar surface part has a flat part, and a second recess is formed in the flat part. A depth dimension of the first recess is greater than a depth dimension of the second recess. The electrostatic chuck can suppress the generation of particles and can easily recover a clean state of the electrostatic chuck surface.
公开/授权文献
- US20130201597A1 ELECTROSTATIC CHUCK 公开/授权日：2013-08-08
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