发明授权
- 专利标题: Magnetoresistance effect element and magnetic memory
- 专利标题(中): 磁阻效应元件和磁存储器
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申请号: US13701846申请日: 2011-05-31
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公开(公告)号: US08917541B2公开(公告)日: 2014-12-23
- 发明人: Hideo Ohno , Shoji Ikeda , Fumihiro Matsukura , Masaki Endoh , Shun Kanai , Hiroyuki Yamamoto , Katsuya Miura
- 申请人: Hideo Ohno , Shoji Ikeda , Fumihiro Matsukura , Masaki Endoh , Shun Kanai , Hiroyuki Yamamoto , Katsuya Miura
- 申请人地址: JP Tokyo JP Miyagi
- 专利权人: Hitachi, Ltd.,Tohoku University
- 当前专利权人: Hitachi, Ltd.,Tohoku University
- 当前专利权人地址: JP Tokyo JP Miyagi
- 代理机构: Antonelli, Terry, Stout & Kraus, LLP.
- 优先权: JP2010-129086 20100604
- 国际申请: PCT/JP2011/062493 WO 20110531
- 国际公布: WO2011/152400 WO 20111208
- 主分类号: G11C11/00
- IPC分类号: G11C11/00 ; G11C11/16 ; H01L43/08 ; H01L43/12 ; H01L43/02 ; G11B5/31 ; H01L27/22
摘要:
Provided are a magneto resistive effect element with a stable magnetization direction perpendicular to a film plane and with a controlled magnetoresistance ratio, and a magnetic memory using the magneto resistive effect element. Ferromagnetic layers 106 and 107 of the magneto resistive effect element are formed from a ferromagnetic material containing at least one type of 3d transition metal such that the magnetoresistance ratio is controlled, and the film thickness of the ferromagnetic layers is controlled on an atomic layer level such that the magnetization direction is changed from a direction in the film plane to a direction perpendicular to the film plane.
公开/授权文献
- US20130094284A1 MAGNETORESISTANCE EFFECT ELEMENT AND MAGNETIC MEMORY 公开/授权日:2013-04-18
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