Invention Grant
US08853775B2 Insulated gate bipolar transistor having control electrode disposed in trench
有权
具有设置在沟槽中的控制电极的绝缘栅双极晶体管
- Patent Title: Insulated gate bipolar transistor having control electrode disposed in trench
- Patent Title (中): 具有设置在沟槽中的控制电极的绝缘栅双极晶体管
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Application No.: US14021586Application Date: 2013-09-09
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Publication No.: US08853775B2Publication Date: 2014-10-07
- Inventor: Tsuneo Ogura , Kazutoshi Nakamura , Hideaki Ninomiya , Tomoko Matsudai , Yuichi Oshino
- Applicant: Kabushiki Kaisha Toshiba
- Applicant Address: JP Tokyo
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Tokyo
- Agency: White & Case LLP
- Priority: JP2012-205741 20120919
- Main IPC: H01L29/66
- IPC: H01L29/66 ; H01L29/739 ; H01L29/423 ; H01L29/06 ; H01L29/10

Abstract:
In one embodiment, a semiconductor device includes a semiconductor substrate having first and second main surfaces, control electrodes disposed in trenches on the first main surface of the semiconductor substrate and extending in a first direction parallel to the first main surface, and control interconnects disposed on the first main surface of the semiconductor substrate and extending in a second direction perpendicular to the first direction. The semiconductor substrate includes a first semiconductor layer of a first conductivity type, second semiconductor layers of a second conductivity type on a surface of the first semiconductor layer on a first main surface side, third semiconductor layers of the first conductivity type disposed on surfaces of the second semiconductor layers on the first main surface side and extending in the second direction, and a fourth semiconductor layer of the second conductivity type on the second main surface of the semiconductor substrate.
Public/Granted literature
- US20140077258A1 SEMICONDUCTOR DEVICE Public/Granted day:2014-03-20
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