发明授权
- 专利标题： Vacuum processing apparatus
- 专利标题（中）： 真空加工设备
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申请号： US12578918申请日： 2009-10-14
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公开(公告)号： US08075691B2公开(公告)日： 2011-12-13
- 发明人: Young Jong Lee , Jun Young Choi , Hyoung-Kyu Son , Jeong-Bin Lee , Gyeong-Hoon Kim , Hyung-Soo Kim , Myung-Woo Han
- 申请人： Young Jong Lee , Jun Young Choi , Hyoung-Kyu Son , Jeong-Bin Lee , Gyeong-Hoon Kim , Hyung-Soo Kim , Myung-Woo Han
- 申请人地址： KR Sungnam-shi
- 专利权人： Advanced Display Process Engineering Co. Ltd.
- 当前专利权人： Advanced Display Process Engineering Co. Ltd.
- 当前专利权人地址： KR Sungnam-shi
- 代理机构： KED & Associates, LLP
- 优先权： KR10-2005-0010481 20050204; KR10-2005-0097621 20051017; KR10-2005-0097625 20051017; KR10-2005-0097642 20051017; KR10-2005-0097646 20051017; KR10-2005-0097652 20051017; KR10-2005-0097664 20051017; KR10-2005-0097667 20051017
- 主分类号： C23C16/00
- IPC分类号： C23C16/00 ; H01L21/306 ; B66C1/00 ; B23P19/04
摘要：
Disclosed herein is a vacuum processing apparatus for performing a desired process for a substrate after establishing a vacuum atmosphere therein. More particularly, the vacuum processing apparatus includes a vacuum chamber, which is divided into a chamber body and an upper cover. The upper cover is configured to be easily opened away from and closed to the chamber body.
公开/授权文献
- US20100086383A1 VACUUM PROCESSING APPARATUS 公开/授权日：2010-04-08
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