发明授权
- 专利标题: Phase change material for use in a phase change random access memory, the phase change material having uniformly distributed insulating impurities
- 专利标题(中): 用于相变随机存取存储器的相变材料,相变材料具有均匀分布的绝缘杂质
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申请号: US11498796申请日: 2006-08-04
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公开(公告)号: US07956342B2公开(公告)日: 2011-06-07
- 发明人: Jin-seo Noh , Yoon-ho Khang , Sang-mock Lee , Dong-seok Suh
- 申请人: Jin-seo Noh , Yoon-ho Khang , Sang-mock Lee , Dong-seok Suh
- 申请人地址: KR Gyeonggi-do
- 专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人地址: KR Gyeonggi-do
- 代理机构: Harness, Dickey & Pierce, P.L.C.
- 优先权: KR10-2005-0071482 20050804
- 主分类号: H01L29/02
- IPC分类号: H01L29/02 ; H01L29/12
摘要:
Insulating impurities may be uniformly distributed over an entire or partial region of the phase change material. The PRAM may include a phase change layer including the phase change material. The insulating impurity content of the phase change material may be 0.1 to 10% (inclusive) the volume of the phase change material. The insulating impurity content of the phase change material may be adjusted by controlling the power applied to a target including the insulating impurities.
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