发明授权
- 专利标题: Aluminum-nitride sintered body, method for fabricating the same, and semiconductor substrate comprising the same
- 专利标题(中): 氮化铝烧结体及其制造方法以及包含该氮化物的半导体衬底
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申请号: US09304531申请日: 1999-05-04
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公开(公告)号: US06294275B1公开(公告)日: 2001-09-25
- 发明人: Masuhiro Natsuhara , Hirohiko Nakata , Yasuhisa Yushio , Motoyuki Tanaka , Shunji Nagao , Akira Shinkoda , Kazutaka Sasaki
- 申请人: Masuhiro Natsuhara , Hirohiko Nakata , Yasuhisa Yushio , Motoyuki Tanaka , Shunji Nagao , Akira Shinkoda , Kazutaka Sasaki
- 优先权: JP10/123022 19980506
- 主分类号: B32B900
- IPC分类号: B32B900
摘要:
An aluminum-nitride sintered body that has both high thermal conductivity and high mechanical strength, a fabricating method for the same, and a semiconductor substrate comprising the same. A material powder is prepared by mixing an aluminum-nitride powder, constituting 1 to 95 wt. %, having an average particle diameter of 1.0 &mgr;m or less obtained by chemical vapor deposition, with another type or types of aluminum-nitride powders constituting the remaining part. The material powder is sintered in a non-oxidizing atmosphere to obtain a sintered body having an average grain diameter of 2 &mgr;m or less and a half width of the diffraction peak on the (302) plane, obtained by X-ray diffraction, of 0.24 deg. or less. Formation of a metallized layer on the sintered body yields a semiconductor substrate.
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