发明授权
US4777103A Electrophotographic multi-layered photosensitive member having a top protective layer of hydrogenated amorphous silicon carbide and method for fabricating the same 失效
具有氢化非晶碳化硅的顶部保护层的电子照相多层感光构件及其制造方法

  • 专利标题: Electrophotographic multi-layered photosensitive member having a top protective layer of hydrogenated amorphous silicon carbide and method for fabricating the same
  • 专利标题(中): 具有氢化非晶碳化硅的顶部保护层的电子照相多层感光构件及其制造方法
  • 申请号: US923556
    申请日: 1986-10-27
  • 公开(公告)号: US4777103A
    公开(公告)日: 1988-10-11
  • 发明人: Hiroshi NoShin ArakiHideki KamajiKohei Kiyota
  • 申请人: Hiroshi NoShin ArakiHideki KamajiKohei Kiyota
  • 申请人地址: JPX Kanagawa
  • 专利权人: Fujitsu Limited
  • 当前专利权人: Fujitsu Limited
  • 当前专利权人地址: JPX Kanagawa
  • 优先权: JPX60-244796 19851030; JPX61-137500 19860613
  • 主分类号: G03G5/082
  • IPC分类号: G03G5/082 G03G5/14
Electrophotographic multi-layered photosensitive member having a top
protective layer of hydrogenated amorphous silicon carbide and method
for fabricating the same
摘要:
An electrophotographic multi-layered photosensitive member having a top layer of hydrogenated amorphous silicon carbide and the method for forming the top layer are provided. The hydrogenated amorphous silicon carbide has an atomic ratio of carbon to carbon plus silicon C/(Si+C) ranging from 0.17 to 0.47 and a ratio of the number of hydrogen atoms bonded to a silicon atom per silicon atom, to number of hydrogen atoms bonded to a carbon atom per carbon atom, {(Si--H)/Si}/{(C--H)/C}, ranging from 0.3 to 1.0. The top layer is formed on a photosensitive member of hydrogenated amorphous silicon by employing a glow discharge CVD method. The gaseous mixture composed of disilane (Si.sub.2 H.sub.6) and propane (C.sub.3 H.sub.8) mixed with a mol ratio expressed as C.sub.3 H.sub.8 /(Si.sub.2 H.sub.6 +C.sub.3 H.sub.8) ranging from 0.2 to 0.6 is used. Another gaseous mixture is also used with an improved result. The mixture comprises disilane (Si.sub.2 H.sub.6) gas, propane (C.sub.3 H.sub.8) gas, and hydrogen (H.sub.2) gas, the mixing mol ratio of the propane gas to the disilane gas expressed as C.sub.3 H.sub.8 /(Si.sub.2 H.sub.6 +C.sub.3 H.sub.8) ranging from 02 to 0.7, and the mixing mol ratio of the hydrogen gas to the remaining gas, H.sub.2 /(Si.sub.2 H.sub.6 +C.sub.3 H.sub.8), ranging from 1 to 10.
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