Invention Publication
- Patent Title: NONVOLATILE MEMORY DEVICE AND METHOD FOR FABRICATING THE SAME
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Application No.: US18328192Application Date: 2023-06-02
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Publication No.: US20240221832A1Publication Date: 2024-07-04
- Inventor: Seyun KIM , Kyunghun Kim , Sunho Kim , Hyungyung Kim , Seungyeul Yang , Gukhyon Yon , Minhyun Lee , Joonsuk Lee , Seokhoon Choi , Hoseok Heo
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR Suwon-si
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Suwon-si
- Priority: KR 20230000919 2023.01.03
- Main IPC: G11C16/04
- IPC: G11C16/04 ; H01L29/16 ; H01L29/18 ; H10B43/10 ; H10B43/27 ; H10B43/35

Abstract:
Provided is a nonvolatile memory device. The nonvolatile memory device includes: a channel layer; a plurality of gate electrodes and a plurality of insulating layers being spaced apart from the channel layer and being alternately arranged; a charge trap layer between the channel layer and a gate electrode, and a charge tunneling layer between the channel layer and the charge trap layer.
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