Invention Publication
- Patent Title: PIEZOELECTRIC FILM, METHOD OF PRODUCING PIEZOELECTRIC FILM, PIEZOELECTRIC ELEMENT, AND PIEZOELECTRIC DEVICE
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Application No.: US18283607Application Date: 2022-03-28
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Publication No.: US20240172564A1Publication Date: 2024-05-23
- Inventor: Gaku TSUBURAOKA , Daisuke NAKAMURA , Taketo ISHIKAWA , Hironobu MACHINAGA
- Applicant: NITTO DENKO CORPORATION
- Applicant Address: JP Ibaraki-shi, Osaka
- Assignee: NITTO DENKO CORPORATION
- Current Assignee: NITTO DENKO CORPORATION
- Current Assignee Address: JP Ibaraki-shi, Osaka
- Priority: JP 21056823 2021.03.30 JP 21158022 2021.09.28 JP 22046696 2022.03.23
- International Application: PCT/JP2022/015069 2022.03.28
- Date entered country: 2023-09-22
- Main IPC: H10N30/853
- IPC: H10N30/853 ; C04B35/453 ; C30B23/08 ; C30B25/06 ; C30B29/16 ; H10N30/076

Abstract:
A piezoelectric film contains a piezoelectric material having a wurtzite-type crystal structure as a main component, and an additive element containing Kr, wherein the piezoelectric material contains a component selected from the group consisting of Zn, Al, Ga, Cd, and Si, as an electropositive element, and wherein a ratio of a content of Kr element to a content of contained elements in the piezoelectric material is in a range from 0.01 atm % to 0.05 atm %.
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