Invention Publication
- Patent Title: SINGLE CRYSTAL PULLING APPARATUS AND METHOD FOR PULLING SINGLE CRYSTAL
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Application No.: US18272253Application Date: 2021-11-22
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Publication No.: US20240076800A1Publication Date: 2024-03-07
- Inventor: Hiroyuki KAMADA , Kiyotaka TAKANO
- Applicant: SHIN-ETSU HANDOTAI CO., LTD.
- Applicant Address: JP Tokyo
- Assignee: SHIN-ETSU HANDOTAI CO., LTD.
- Current Assignee: SHIN-ETSU HANDOTAI CO., LTD.
- Current Assignee Address: JP Tokyo
- Priority: JP 21010298 2021.01.26
- International Application: PCT/JP2021/042776 2021.11.22
- Date entered country: 2023-07-13
- Main IPC: C30B30/04
- IPC: C30B30/04 ; C30B15/20 ; C30B29/06

Abstract:
A single crystal pulling apparatus includes: a pulling furnace having a central axis; and magnetic field generating apparatus around the pulling furnace and having coils, for applying a horizontal magnetic field to molten semiconductor raw material to suppress convection in crucible, in which, main coils and sub-coils are provided, as the main coils, two pairs of coils arranged facing each other are provided, two coil axes thereof are included in the same horizontal plane, a center angle α between the two coil axes sandwiching the X-axis, which is a magnetic force line direction on the central axis in the horizontal plane, is 100 degrees or more and 120 degrees or less, as the sub-coils, a pair of superconducting coils arranged to face each other is provided and its one coil axis is aligned with the X-axis, and current values of the main coils and the sub-coils can be set independently.
Information query
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