Invention Application
- Patent Title: VARIABLE HEIGHT SLANTED GRATING METHOD
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Application No.: US17948062Application Date: 2022-09-19
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Publication No.: US20230010821A1Publication Date: 2023-01-12
- Inventor: Morgan EVANS , Rutger MEYER TIMMERMAN THIJSSEN
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Main IPC: F21V8/00
- IPC: F21V8/00 ; G02B5/18 ; G02B27/01
Abstract:
An apparatus with a grating structure and a method for forming the same are disclosed. The grating structure includes forming a recess in a grating layer. A plurality of channels is formed in the grating layer to define slanted grating structures therein. The recess and the slanted grating structures are formed using a selective etch process.
Public/Granted literature
- US12130465B2 Variable height slanted grating method Public/Granted day:2024-10-29
Information query
