Invention Application
- Patent Title: MULTIPLE CHARGED-PARTICLE BEAM APPARATUS WITH LOW CROSSTALK
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Application No.: US17127956Application Date: 2020-12-18
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Publication No.: US20210193437A1Publication Date: 2021-06-24
- Inventor: Weiming REN , Zizhou GONG , Xuerang HU , Xuedong LIU , Zhong-wei CHEN
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Main IPC: H01J37/317
- IPC: H01J37/317 ; H01J37/28 ; H01J37/244 ; H01J37/141 ; H01J37/20 ; H01J37/147

Abstract:
Systems and methods of forming images of a sample using a multi-beam apparatus are disclosed. The method may include generating a plurality of secondary electron beams from a plurality of probe spots on the sample upon interaction with a plurality of primary electron beams. The method may further include adjusting an orientation of the plurality of primary electron beams interacting with the sample, directing the plurality of secondary electron beams away from the plurality of primary electron beams, compensating astigmatism aberrations of the plurality of directed secondary electron beams, focusing the plurality of directed secondary electron beams onto a focus plane, detecting the plurality of focused secondary electron beams by a charged-particle detector, and positioning a detection plane of the charged-particle detector at or close to the focus plane.
Public/Granted literature
- US12211669B2 Multiple charged-particle beam apparatus with low crosstalk Public/Granted day:2025-01-28
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