Invention Application
- Patent Title: Backplane, Preparation Method Thereof, Backlight Module and Display Device
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Application No.: US16920401Application Date: 2020-07-02
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Publication No.: US20210036196A1Publication Date: 2021-02-04
- Inventor: Zhiwei LIANG , Wenqian LUO , Yingwei LIU , Ke WANG , Shengguang BAN , Zhanfeng CAO
- Applicant: BOE Technology Group Co., Ltd.
- Applicant Address: CN Beijing
- Assignee: BOE Technology Group Co., Ltd.
- Current Assignee: BOE Technology Group Co., Ltd.
- Current Assignee Address: CN Beijing
- Priority: CN201910708843.X 20190801
- Main IPC: H01L33/62
- IPC: H01L33/62 ; H01L23/00

Abstract:
A preparation method of a backplane includes: forming an insulating structure layer having a groove on a base substrate by a mask exposure process, the groove being used for accommodating a metal trace; and repeating a metal sub-layer forming step including an ashing process and a wet etching process multiple times to form the metal trace positioned in the groove.
Public/Granted literature
- US11742467B2 Backplane, preparation method with dual damascene steps Public/Granted day:2023-08-29
Information query
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