Invention Grant
- Patent Title: Backplane, preparation method with dual damascene steps
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Application No.: US16920401Application Date: 2020-07-02
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Publication No.: US11742467B2Publication Date: 2023-08-29
- Inventor: Zhiwei Liang , Wenqian Luo , Yingwei Liu , Ke Wang , Shengguang Ban , Zhanfeng Cao
- Applicant: BOE Technology Group Co., Ltd.
- Applicant Address: CN Beijing
- Assignee: BOE Technology Group Co., Ltd.
- Current Assignee: BOE Technology Group Co., Ltd.
- Current Assignee Address: CN Beijing
- Agency: Ling and Yang Intellectual Property
- Agent Ling Wu; Stephen Yang
- Priority: CN 1910708843.X 2019.08.01
- Main IPC: H01L33/62
- IPC: H01L33/62 ; H01L23/00

Abstract:
A preparation method of a backplane includes: forming an insulating structure layer having a groove on a base substrate by a mask exposure process, the groove being used for accommodating a metal trace; and repeating a metal sub-layer forming step including an ashing process and a wet etching process multiple times to form the metal trace positioned in the groove.
Public/Granted literature
- US20210036196A1 Backplane, Preparation Method Thereof, Backlight Module and Display Device Public/Granted day:2021-02-04
Information query
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