Invention Application
- Patent Title: SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME
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Application No.: US16140776Application Date: 2018-09-25
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Publication No.: US20190103463A1Publication Date: 2019-04-04
- Inventor: KOUICHI SAITOU
- Applicant: Panasonic Intellectual Property Management Co., Ltd.
- Priority: JP2017-194440 20171004
- Main IPC: H01L29/16
- IPC: H01L29/16 ; H01L23/544 ; H01L21/033 ; H01L21/308 ; H01L29/78 ; H01L21/04
Abstract:
A semiconductor device includes a bulk substrate, and an epitaxial layer formed on a surface of the bulk substrate. A part of the surface of the bulk substrate is an alignment region including an alignment pattern defined by at least one recess or one protrusion. An ion-injected layer is formed in at least a part of the alignment region.
Public/Granted literature
- US10763331B2 Semiconductor device including ion implanted alignment marks and method of manufacturing the same Public/Granted day:2020-09-01
Information query
IPC分类:
