Invention Application
- Patent Title: PERMANENT MAGNET COMPRISING A STACK OF N PATTERNS
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Application No.: US15654115Application Date: 2017-07-19
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Publication No.: US20180025840A1Publication Date: 2018-01-25
- Inventor: Bertrand DELAET , Sophie GIROUD , Rachid HIDA
- Applicant: Commissariat a l'energie atomique et aux energies alternatives
- Applicant Address: FR Paris
- Assignee: Commissariat a l'energie atomique et aux energies alternatives
- Current Assignee: Commissariat a l'energie atomique et aux energies alternatives
- Current Assignee Address: FR Paris
- Priority: FR1656928 20160720
- Main IPC: H01F41/02
- IPC: H01F41/02 ; H01F41/30 ; H01F1/00 ; H01F7/02 ; G01R33/028 ; H01F10/32

Abstract:
A permanent magnet including, at least once per group of ten consecutive ferromagnetic layers, a growth layer directly interposed between a top antiferromagnetic layer of a previous pattern and a bottom antiferromagnetic layer of a following pattern. This growth layer is entirely realized in a nonmagnetic material chosen from the group made up of the following metals: Ta, Cu, Ru, V, Mo, Hf, Mg, NiCr and NiFeCr, or it is realized by a stack of several sublayers of nonmagnetic material disposed immediately on one another, at least one of these sublayers being entirely realized in a material chosen from the group. The thickness of the growth layer is greater than 0.5 nm.
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