Invention Application
- Patent Title: System and Method for Wafer Inspection with a Noise Boundary Threshold
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Application No.: US15388577Application Date: 2016-12-22
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Publication No.: US20170284944A1Publication Date: 2017-10-05
- Inventor: Xuguang Jiang , Yong Zhang
- Applicant: KLA-Tencor Corporation
- Main IPC: G01N21/95
- IPC: G01N21/95 ; G06T7/00 ; G06T7/136 ; H01L21/66 ; G06T5/40

Abstract:
A method includes receiving one or more images of three or more die of a wafer, determining a median intensity value of a set of pixel intensity values acquired from a same location on each of the three or more die, determining a difference intensity value for the set of pixel intensity values by comparing the median intensity value of the set of pixel intensity values to each pixel intensity value, grouping the pixel intensity values into an intensity bin based on the median intensity value of the set of pixel intensity values, generating an initial noise boundary based on a selected difference intensity value in the intensity bin, generating a final noise boundary by adjusting the initial noise boundary, generating a detection boundary by applying a threshold to the final noise boundary, and classifying one or more pixel intensity values outside the detection boundary as a defect.
Public/Granted literature
- US10533953B2 System and method for wafer inspection with a noise boundary threshold Public/Granted day:2020-01-14
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