Invention Application
- Patent Title: Reactant Delivery System For ALD/CVD Processes
- Patent Title (中): ALD / CVD工艺的反应物输送系统
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Application No.: US13554487Application Date: 2012-07-20
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Publication No.: US20130019960A1Publication Date: 2013-01-24
- Inventor: Kenric Choi , Joseph Yudovsky , Steven D. Marcus , Ernesto Ulloa
- Applicant: Kenric Choi , Joseph Yudovsky , Steven D. Marcus , Ernesto Ulloa
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Main IPC: F16K49/00
- IPC: F16K49/00 ; F16K11/00
Abstract:
Provided are apparatus and methods for generating a chemical precursor. The apparatus comprises an inlet line to be connected to an ampoule and an outlet line to be connected to an ampoule. The inlet line having an inlet valve to control the flow of a carrier gas into the ampoule and the outlet line has an outlet valve to control the flow exiting the ampoule. A bypass valve allows carrier gas to bypass the ampoule and purge the outlet valve without flowing gas into the ampoule.
Information query
