发明申请
- 专利标题: Semiconductor devices and methods of manufacturing and operating same
- 专利标题(中): 半导体器件和制造和操作方法相同
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申请号: US12289055申请日: 2008-10-20
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公开(公告)号: US20090101962A1公开(公告)日: 2009-04-23
- 发明人: Seunghun Hong , Sung Myung , Jiwoon Im , Minbaek Lee
- 申请人: Seunghun Hong , Sung Myung , Jiwoon Im , Minbaek Lee
- 专利权人: SAMSUNG ELECTRONICS CO., LTD.
- 当前专利权人: SAMSUNG ELECTRONICS CO., LTD.
- 优先权: KR10-2007-0105102 20071018; KR10-2008-0097406 20081002
- 主分类号: H01L29/768
- IPC分类号: H01L29/768 ; H01L21/336
摘要:
A semiconductor device and methods of manufacturing and operating the semiconductor device may be disclosed. The semiconductor device may comprise different nanostructures. The semiconductor device may have a first element formed of nanowires and a second element formed of nanoparticles. The nanowires may be ambipolar carbon nanotubes (CNTs). The first element may be a channel layer. The second element may be a charge trap layer. In this regard, the semiconductor device may be a transistor or a memory device.
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