Invention Grant
- Patent Title: Method and apparatus for inspection and metrology
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Application No.: US18095515Application Date: 2023-01-10
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Publication No.: US12204826B2Publication Date: 2025-01-21
- Inventor: Lotte Marloes Willems , Kaustuve Bhattacharyya , Panagiotis Pieter Bintevinos , Guangqing Chen , Martin Ebert , Pieter Jacob Mathias Hendrik Knelissen , Stephen Morgan , Maurits Van Der Schaar , Leonardus Henricus Marie Verstappen , Jen-Shiang Wang , Peter Hanzen Wardenier
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman, LLP
- Main IPC: G03F7/00
- IPC: G03F7/00 ; G03F9/00 ; G06F30/20 ; G06F111/10

Abstract:
A method including performing a simulation to evaluate a plurality of metrology targets and/or a plurality of metrology recipes used to measure a metrology target, identifying one or more metrology targets and/or metrology recipes from the evaluated plurality of metrology targets and/or metrology recipes, receiving measurement data of the one or more identified metrology targets and/or metrology recipes, and using the measurement data to tune a metrology target parameter or metrology recipe parameter.
Public/Granted literature
- US20230185990A1 METHOD AND APPARATUS FOR INSPECTION AND METROLOGY Public/Granted day:2023-06-15
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