发明授权
- 专利标题: Resonators
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申请号: US17450592申请日: 2021-10-12
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公开(公告)号: US12087994B2公开(公告)日: 2024-09-10
- 发明人: Antoine Pacco , Massimo Mongillo , Anton Potocnik , Danny Wan , Jeroen Verjauw
- 申请人: IMEC vzw , Katholieke Universiteit Leuven
- 申请人地址: BE Leuven
- 专利权人: IMEC vzw,Katholieke Universiteit Leuven
- 当前专利权人: IMEC vzw,Katholieke Universiteit Leuven
- 当前专利权人地址: BE Leuven; BE Leuven
- 代理机构: Knobbe Martens Olson & Bear LLP
- 优先权: EP 201465 2020.10.13
- 主分类号: H01P7/00
- IPC分类号: H01P7/00 ; H01P11/00
摘要:
A method for forming a modified resonator is provided. In one aspect, the method includes obtaining a resonator on top of a substrate, thereby forming an interface area between a bottom surface of the resonator and a top surface of the substrate. The resonator can include niobium or tantalum. The method also includes contacting the resonator and the substrate with a liquid acidic etching solution selected so as to have a higher etch rate towards the substrate than towards the resonator and a nonzero etch rate towards the resonator.
公开/授权文献
- US20220115759A1 RESONATORS 公开/授权日:2022-04-14
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