Invention Grant
- Patent Title: Memory device having 2-transistor vertical memory cell and shield structures
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Application No.: US18200871Application Date: 2023-05-23
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Publication No.: US12080331B2Publication Date: 2024-09-03
- Inventor: Kamal M. Karda , Haitao Liu , Karthik Sarpatwari , Durai Vishak Nirmal Ramaswamy , Alessandro Calderoni , Richard E Fackenthal , Duane R. Mills
- Applicant: Micron Technology, Inc.
- Applicant Address: US ID Boise
- Assignee: Micron Technology, Inc.
- Current Assignee: Micron Technology, Inc.
- Current Assignee Address: US ID Boise
- Agency: Schwegman Lundberg & Woessner, P.A.
- The original application number of the division: US17186962 2021.02.26
- Main IPC: G11C11/404
- IPC: G11C11/404

Abstract:
Some embodiments include apparatuses in which one of such apparatus includes a first memory cell including a first transistor having a first channel region coupled between a data line and a conductive region, and a first charge storage structure located between the first data line and the conductive region, and a second transistor having a second channel region coupled to and located between the first data line and the first charge storage structure; a second memory cell including a third transistor having a third channel region coupled between a second data line and the conductive region, and a second charge storage structure located between the second data line and the conductive region, and a fourth transistor having a fourth channel region coupled to and located between the second data line and the second charge storage structure; a conductive line forming a gate of each of the first, second, third, and fourth transistors; and a conductive structure located between the first and second charge storage structures and electrically separated from the conductive region.
Public/Granted literature
- US20230298652A1 MEMORY DEVICE HAVING 2-TRANSISTOR VERTICAL MEMORY CELL AND SHIELD STRUCTURES Public/Granted day:2023-09-21
Information query
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