- 专利标题: Variable resistance non-volatile memory element and variable resistance non-volatile memory device using the element
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申请号: US17356029申请日: 2021-06-23
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公开(公告)号: US11889776B2公开(公告)日: 2024-01-30
- 发明人: Ryutaro Yasuhara , Satoru Fujii , Takumi Mikawa , Atsushi Himeno , Kengo Nishio , Takehide Miyazaki , Hiroyuki Akinaga , Yasuhisa Naitoh , Hisashi Shima
- 申请人: Nuvoton Technology Corporation Japan
- 申请人地址: JP Kyoto
- 专利权人: Nuvoton Technology Corporation Japan
- 当前专利权人: Nuvoton Technology Corporation Japan
- 当前专利权人地址: JP Kyoto
- 代理机构: Rimon P.C.
- 优先权: JP 18241986 2018.12.26
- 主分类号: H10N70/00
- IPC分类号: H10N70/00 ; H10B63/00 ; H10N70/20
摘要:
A variable resistance non-volatile memory element includes first and second electrodes and a variable resistance layer between the electrodes. The layer has a resistance value reversibly variable based on an electrical signal. The layer includes a first variable resistance layer that includes an oxygen deficient first metal oxide containing a first metal element and oxygen, and a second variable resistance layer that includes a composite oxide containing the first metal element, a second metal element different from the first metal element, and oxygen, and having a different degree of oxygen deficiency from the first metal oxide. The composite oxide has a lower degree of oxygen deficiency than the first metal oxide. At room temperature, the composite oxide has a smaller oxygen diffusion coefficient than a second metal oxide containing the first metal element and oxygen, and having the degree of oxygen deficiency equal to that of the composite oxide.
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