- 专利标题: Imprint method, imprint apparatus, and film formation apparatus
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申请号: US17466259申请日: 2021-09-03
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公开(公告)号: US11852985B2公开(公告)日: 2023-12-26
- 发明人: Takeshi Higuchi , Anupam Mitra , Takahiro Iwasaki
- 申请人: Kioxia Corporation
- 申请人地址: JP Tokyo
- 专利权人: KIOXIA CORPORATION
- 当前专利权人: KIOXIA CORPORATION
- 当前专利权人地址: JP Tokyo
- 代理机构: Foley & Lardner LLP
- 优先权: JP 20156112 2020.09.17
- 主分类号: G03F9/00
- IPC分类号: G03F9/00 ; G03F7/00 ; G03F7/16 ; G03F7/09 ; G03F7/004 ; G03F7/20 ; G03F7/038
摘要:
An imprint method includes supplying a first photocurable resist to a first region of an object; irradiating the first resist with first light; forming a second resist over the object; bringing a template into contact with the second resist; and irradiating at least the second resist with second light through the template while the template is in contact with the second resist.
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