- 专利标题: Method and apparatus for detecting ferroelectric signal
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申请号: US17381195申请日: 2021-07-21
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公开(公告)号: US11703523B2公开(公告)日: 2023-07-18
- 发明人: Wei-Shan Hu , Dong Gui , Jang-Jung Lee
- 申请人: Taiwan Semiconductor Manufacturing Company, Ltd.
- 申请人地址: TW Hsinchu
- 专利权人: Taiwan Semiconductor Manufacturing Company, Ltd.
- 当前专利权人: Taiwan Semiconductor Manufacturing Company, Ltd.
- 当前专利权人地址: TW Hsinchu
- 代理机构: JCIPRNET
- 主分类号: G01Q60/24
- IPC分类号: G01Q60/24 ; G01Q60/30 ; G01Q60/38 ; B82Y35/00
摘要:
A method of detecting a ferroelectric signal from a ferroelectric film and a piezoelectric force microscopy (PFM) apparatus are provided. The method includes following steps. An input waveform signal is applied to the ferroelectric film. An atomic force microscope probe scans over a surface of the ferroelectric film to measure a surface topography of the ferroelectric film. A deflection of the atomic force microscope probe is detected when the input waveform signal is applied to the ferroelectric film to generate a deflection signal. Spectrum data of the ferroelectric film based on the deflection signal is generated. The spectrum data of the ferroelectric film is analyzed to determine whether the spectrum data of the ferroelectric film is a ferroelectric signal or a non-ferroelectric signal.
公开/授权文献
- US20210349126A1 METHOD AND APPARATUS FOR DETECTING FERROELECTRIC SIGNAL 公开/授权日:2021-11-11
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