- 专利标题: Imaging element, stacked imaging element, and solid-state imaging apparatus
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申请号: US16624205申请日: 2018-06-21
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公开(公告)号: US11670659B2公开(公告)日: 2023-06-06
- 发明人: Taiichiro Watanabe , Fumihiko Koga , Kyosuke Ito , Hideaki Togashi , Yusaku Sugimori
- 申请人: SONY SEMICONDUCTOR SOLUTIONS CORPORATION
- 申请人地址: JP Kanagawa
- 专利权人: SONY SEMICONDUCTOR SOLUTIONS CORPORATION
- 当前专利权人: SONY SEMICONDUCTOR SOLUTIONS CORPORATION
- 当前专利权人地址: JP Kanagawa
- 代理机构: K&L Gates LLP
- 优先权: JP 2017121200 2017.06.21 JP 2018115847 2018.06.19
- 国际申请: PCT/JP2018/023598 2018.06.21
- 国际公布: WO2018/235895A 2018.12.27
- 进入国家日期: 2019-12-18
- 主分类号: H01L27/146
- IPC分类号: H01L27/146 ; H04N25/77
摘要:
An imaging element includes a photoelectric conversion unit including a first electrode 11, a photoelectric conversion layer 13, and a second electrode 12 that are stacked, in which the photoelectric conversion unit further includes a charge storage electrode 14 arranged apart from the first electrode 11 and arranged to face the photoelectric conversion layer 13 through an insulating layer 82, and when photoelectric conversion occurs in the photoelectric conversion layer 13 after light enters the photoelectric conversion layer 13, an absolute value of a potential applied to a part 13C of the photoelectric conversion layer 13 facing the charge storage electrode 14 is a value larger than an absolute value of a potential applied to a region 13B of the photoelectric conversion layer 13 positioned between the imaging element and an adjacent imaging element.
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