- 专利标题： Semiconductor device and photomask
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申请号： US17204487申请日： 2021-03-17
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公开(公告)号： US11665898B2公开(公告)日： 2023-05-30
- 发明人: Daisuke Kawamura , Go Oike
- 申请人： Kioxia Corporation
- 申请人地址： JP Tokyo
- 专利权人： Kioxia Corporation
- 当前专利权人： Kioxia Corporation
- 当前专利权人地址： JP Tokyo
- 代理机构： Oblon, McClelland, Maier & Neustadt, L.L.P.
- 优先权： JP 2020141795 2020.08.25
- 主分类号： H01L27/11578
- IPC分类号： H01L27/11578 ; H01L27/11519 ; H01L27/11526 ; H01L27/11565 ; H01L27/11573 ; H01L27/11551
摘要：
A semiconductor device of an embodiment includes first and second structures arranged in a first hierarchy, in which the first and second structures are repeatedly arranged in a first direction along a plane of the first hierarchy, and a distance between geometric centers of the first and second structures in a minimum unit of repetition of the first and second structures differs between a first position and a second position in the first direction.
公开/授权文献
- US20220068950A1 SEMICONDUCTOR DEVICE AND PHOTOMASK 公开/授权日：2022-03-03
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