发明授权
- 专利标题: Laser device
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申请号: US16863277申请日: 2020-04-30
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公开(公告)号: US11532921B2公开(公告)日: 2022-12-20
- 发明人: Hsin-Chan Chung , Shou-Lung Chen
- 申请人: EPISTAR CORPORATION , iReach Corporation
- 申请人地址: TW Hsinchu; TW Hsinchu
- 专利权人: EPISTAR CORPORATION,iReach Corporation
- 当前专利权人: EPISTAR CORPORATION,iReach Corporation
- 当前专利权人地址: TW Hsinchu; TW Hsinchu
- 代理机构: Ditthavong, Steiner & Mlotkowski
- 优先权: TW108115024 20190430
- 主分类号: H01S5/042
- IPC分类号: H01S5/042 ; H01S5/028 ; H01S5/183 ; H01S5/023 ; H01S5/0225 ; H01S5/0233 ; H01S5/0235
摘要:
A semiconductor device includes a substrate, an epitaxial stack disposed on the substrate, a first connection layer between the epitaxial stack and the substrate and a first electrode disposed on the first connection layer. The substrate has a first side surface and a second side surface. The epitaxial stack has a semiconductor structure with a first lateral surface adjacent to the first side surface and a second lateral surface opposing the first lateral surface and adjacent to the second side surface. The first connection layer has a first protruding portion extending beyond the first lateral surface and a second protruding portion extending beyond the second lateral surface. The first electrode is in contact with the first protruding portion and the second protruding portion.
公开/授权文献
- US20200350742A1 LASER DEVICE 公开/授权日:2020-11-05
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